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Plasma-Aided Nanofabrication: From Plasma Sources to Nanoassembly
John Wiley and Sons Ltd, July 2007, Pages: 315
In this single work to cover the use of plasma as nanofabrication tool in sufficient depth internationally renowned authors with much experience in this important method of nanofabrication look at reactive plasma as a nanofabrication tool, plasma production and development of plasma sources, as well as such applications as carbon-based nanostructures, low-dimensional quantum confinement structures and hydroxyapatite bioceramics. Written principally for solid state physicists and chemists, materials scientists, and plasma physicists, the book concludes with the outlook for such applications.
About the Authors:
Dr. Ken Ostrikov, now at the University of Sydney, has been with numerous R&D institutions worldwide. His research topics include chemically active plasmas for nanofabrication, synthesis of functional materials and bio-compatible coatings, development of industrial process specifications and integrated plasma facilities for materials synthesis and surface modification, as well as several fundamental topics. Dr. Ostrikov's work was honored several times and published in more than 200 papers in international journals and conference proceedings.
Shuyan Xu, Nanyang Technological University, is the founding Leader of his research center. Professor Xu's research interests include development of plasma sources for surface processing and modification, materials deposition and low-energy ion implantation, plasma- aided bioceramic coatings, plasma assembly of nanostructures, as well as modelling and simulation of chemically active plasma-grown nanoparticles and nanocluster dynamics and self-organization processes. Professor Xu has published more than 180 papers.
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