• +353-1-416-8900(GMT OFFICE HOURS)
  • 1-800-526-8630(US/CAN TOLL FREE)
  • 1-917-300-0470(EST OFFICE HOURS)
Gases for Semiconductor Device Processing Product Image

Gases for Semiconductor Device Processing

  • Published: April 2010
  • Region: Global
  • 74 Pages
  • Techcet

FEATURED COMPANIES

  • Air Liquide (AL)
  • Linde Group (LG)
  • Praxair
  • Sodiff
  • MORE

The 2009 market for electronic gases totalled $2.37B, down 14 percent from the prior year, according to the report “Gases for Semiconductor Processing 2010.”

The 2010 outlook is for 11 percent growth overall, with the electronic specialty gases segment leading the way with 15 percent growth to $1.6B. The combined electronic gases market is expected to reach beyond $2.9B by 2012, according to Techcet’s forecast.

Sales of specialty gases correlate very closely with silicon wafer consumption, and rode the roller-coaster down with the semiconductor business through the recession. Bulk gases do not track as closely with wafer starts because the gas volumes attributed to other electronic applications are large in comparison to IC bulk gas.

1 HIGHLIGHTS
1.1 Market
1.2 Supply
1.3 Suppliers
1.4 Specialty Gas Highlights

2 INTRODUCTION
2.1 Definition of Bulk and Specialty
2.2 Market Dynamics of 2009

3 THE MARKET
3.1 Regional Share
3.2 Supplier Market Share

4 TECHNOLOGY UPDATES
4.1 Etch Gas Trends
4.1.1 High Aspect Ratio (HAR) Etching
4.1 C-F Gas Concerns
4.2 XeF2 - Ion Implant Source Chamber Cleaning
4.3 XeF2 as an Etch Gas for MEMs
4.4 Xe supply Concerns

5 SHIP TO CONTROL UPDATE

6 SUPPLY ALERT
6.1 HCl Supply Issues
6.2 Helium
6.2.1 Helium Costs Continue to Rise
6.3 Silane
6.4 NF3
6.5 Shipping Logistics

7 ENVIRONMENTAL CONCERNS AFFECTING GAS UTILIZATION
7.1 Future Requirements as Outlined in the ITRS
7.2 PFC emissions reduction
7.3 Legislative Changes
7.4 Kyoto Protocol

8 GAS SUPPLIERS’ PROFILES AND NEWS
8.1 Air Products and Chemicals (AP)
8.2 Air Liquide (AL)
8.3 Linde Group (LG)
8.4 Praxair
8.5 Taiyo Nippon Sanso Corporation (TNSC)/ Matheson Tri-Gas (MTG)
8.6 Sodiff

Appendices
Appendix A: List of Abbreviations and Acronyms
Appendix B: Helium Source/Supply Relationships
Appendix C: Supplier Regional Market Standing
Appendix D: Makers and Purifiers of Selected Gases (from 2009 Report)
Appendix E: Future Gas Purity Requirements
Appendix E: Carbon Trading Basics
Appendix F: PFOS Reduction

Figures
Figure 1: Electronics Process Gas Market Revenues / Forecast — $2.74 B
Figure 2: Electronic Gas Market Revenues
Figure 3: Electronic Gas Consumption Compared to MSI
Figure 4: Regional Sales — Semiconductor Process Gas Consumption (by percent volume)
Figure 5: Bulk and Specialty Electronic Gas Market Shares
Figure 6: Bulk Electronic Gas Market Shares (as a % of Total Revenues)
Figure 7: Specialty Electronic Gas Market Shares
Figure 8: Market Shares by Total Company Revenues
Figure 9: Typical Via Structure
Figure 10.: Samsung 70nm stacked capacitor structures
Figure 11: Comparison of Source Life With No XeF2 (Baseline) and with XeF2 Clean (AutoClean)
Figure 12: AutoClean Source Container for XeF2 Delivery
Figure 13: MEM device floating in free space on a substrate.
Figure 14: Helium Supply and Demand
Figure 15: US Helium Supply vs. Demand
Figure 16: US Helium Usage by Application Percent
Figure 17: Helium Pricing
Figure 18: Silane Capacity by Maker (mT)
Figure 19: Silane Price Trends
Figure 20: Silane WW Revenues and 2010 Forecast
Figure 21: Worldwide Silane Consumption for Electronic Applications
Figure 22: NF3 Price Declines Relative to 2000
Figure 23: NF3 Worldwide Revenues for Electronic Applications
Figure 24: NF3 Worldwide Consumption for Electronic Applications
Figure 25: World Semiconductor Council PFC Emissions Reductions
Figure A2: PFOS Mass Balance, WSC Baseline 2005

Tables

Table 1: World Production and Reserves of Helium
Table 2: Atmospheric Lifetimes and Global Working Potentials of Select Greenhouse Gases
Table 3: ITRS 2009 EHS Chemical Restrictions Table
Table 4: ESH Intrinsic Requirements from ITRS Roadmap 2009
Table 5. 2009 ITRS Roadmap for Chemicals and Materials Management
Table 6: Kyoto Protocol Greenhouse Gases List
Table A-1: Source/Supply Relationships
Table A-2: New Helium Extraction Plants
Table A-3: Regional Market Leaders
Table A-4: Producers for Selected Gases
Table A-5: ITRS 2007/2008 Impurity Limits for Bulk Gases; 68nm = DRAM ½ pitch = 25nm; 2007–2015
Table A-6: ITRS 2007/2008 Impurity Limits for Lithography and Critical Metrology Purge Gases (ppbv); 68nm = DRAM ½ pitch = 25nm; 2007–2015
Table A-7: ITRS 2007/2008 Impurity Limits for Specialty Gases

- Air Products and Chemicals (AP)
- Air Liquide (AL)
- Linde Group (LG)
- Praxair
- Taiyo Nippon Sanso Corporation (TNSC)/ Matheson Tri-Gas (MTG)
- Sodiff

Note: Product cover images may vary from those shown

RELATED PRODUCTS

Our Clients

Our clients' logos