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Metal-containing Hydrogenated Amorphous Carbon Thin 
Films. Edition No. 1 - Product Image

Metal-containing Hydrogenated Amorphous Carbon Thin Films. Edition No. 1

  • Published: April 2009
  • 192 Pages
  • VDM Publishing House

The growth and characteristics of metal containing
amorphous hydrogenated carbon thin films (a-C:H/Me)
were studied in this research. The discovery and the
explanation of unprecedented self-assembled,
alternating nano-layered structures are addressed. a-
C:H/Me thin films were synthesized using one single
target, a rotating but not revolving substrate, and
constant feed gas compositions in a conventional
reactive sputter deposition chamber. In order to
explain the formation of the distinct structures,
correlations were first made among the deposition
rate, the composition, the crystallinity, the
surface chemistry, and the microstructure of a-
C:H/Me thin films. As a result, a processing window
was obtained for the formation of the self-
assembled, alternating nano-layered structures. It
was found that such structures can be obtained under
controlled growth parameters for selected metals. A
growth mechanism based on the considerations of
clustering of carbon and metal, segregation of
carbon, catalytic effects of metal, formation of
carbide, energy of adatoms, and surface diffusion of
metal and carbon, has been developed.

Wan-Yu, Wu.
Wan-Yu Wu was born in 1978 in Taipei, Taiwan and is currently a
post doctor fellow at the National Cheng Kung University in the
city of Tainan, Taiwan. Wu received both her BS and Ph.D.
degrees from the Department of Materials Science and Engineering
at the National Cheng Kung University.

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