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Rapid Thermal and Integrated Processing IV: Volume 387. MRS Proceedings

  • ID: 2129218
  • October 1995
  • 455 Pages
  • Cambridge University Press
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The fourth in a continuing series on rapid thermal processing (RTP), this volume addresses work in traditional RTP processes such as dielectric growth, annealing and silicides, as well as developments in integrated processes. The primary focus, however, is the manufacturing aspects of RTP and the successful integration of RTP into production semiconductor fabs. Emphasis is placed on process and equipment modelling and the critical aspects of RTP, such as temperature measurement, uniformity and control. Topics include: modelling, sensors and control; integrated processing and manufacturing; dielectrics; epitaxy, polysilicon and devices; and junctions, metallization and contacts.

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Steven R. J. Brueck University of New Mexico.

Jeffrey C. Gelpey
Ahman Kermani
Jorgé L. Regolini
James C. Sturm Princeton University, New Jersey.

Note: Product cover images may vary from those shown
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Note: Product cover images may vary from those shown

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