This is a comprehensive survey and a detailed description of most advanced high density plasma sources used in plasma processing. The book is a balanced presentation in that it gives both a theoretical treatment and practical applications. It should be of considerable interest to scientists and engineers working on plasma source design, and process development.
Planar Inductive Sources
Electrostatically-Shielded Inductively-Coupled RF Plasma Sources
Very High Frequency Capacitive Plasma Sources
Surface Wave Plasma Sources
Microwave Plasma Disk Processing Machines
Electron Cyclotron Resonance Plasma Sources
Distributed ECR Plasma Sources