Chemical Vapor Deposition of Refractory Metals and Ceramics III: Volume 363. MRS Proceedings

  • ID: 2129201
  • Book
  • 283 Pages
  • Cambridge University Press
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CVD (chemical vapor deposition) technology is receiving much interest in the scientific community, in particular for synthesizing new materials with tailored chemical composition and physical properties that offer multiple functionality. Multiphase or multilayered films, functionally graded materials (FGMs), “smart” material structures and nanocomposites are just a few examples of the new classes of materials being produced via CVD. This third volume in the series from MRS offers an interdisciplinary perspective on technological issues relevant to CVD materials and processes, and provides a forum for the exchange of new scientific results. Topics include: fundamentals, modeling and diagnostics; process/microstructure/property relationships; diamond, cubic boron nitride and related materials; organometallic chemical vapor deposition and novel approaches.
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Bernard M. Gallois Stevens Institute of Technology, New Jersey.

Woo Y. Lee
Michael A. Pickering
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