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Modeling and Simulation of Thin-Film Processing: Volume 389. MRS Proceedings

  • ID: 2129220
  • Book
  • 382 Pages
  • Cambridge University Press
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A diverse set of materials science communities come together in this volume to review the extraordinary progress made in the development of computer simulation and modeling techniques for the prediction of film morphology, microstructure, composition, profile and structure. These techniques are rapidly moving out of the area of academic research and into technological and production design areas of thin-film-based industries. The book is loosely organized in ascending order of modeling-length scales - from atomic, up to the entire deposition reactor. Topics include: deposition and growth modeling; film morphology and topology; film microstructure; failure mechanisms; etching; process modeling and control and reactor-scale modeling.
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Michael J. Fluss Lawrence Livermore National Laboratory, California.

Robert J. Kee
David J. Srolovitz University of Michigan, Ann Arbor.

Cynthia A. Volkert AT&T Bell Laboratories, New Jersey.
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