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Rapid Thermal and Integrated Processing V: Volume 429. MRS Proceedings

  • ID: 2129254
  • Book
  • 389 Pages
  • Cambridge University Press
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This book is the latest in a continuing series on rapid thermal processing and related topics. It embraces a diversity of research, development and manufacturing activities that require rapid thermal and integrated processing techniques which are recognized by their acronyms, such as rapid thermal annealing (RTA), rapid thermal processing (RTP), rapid thermal chemical vapor deposition (RTCVP), rapid thermal oxidation (RTO), and others. This fifth anniversary volume reports notable advances in the use of rapid thermal techniques in processing science and technology, and for process control in industrial fabrication facilities. It is organized around progress obtained through: evaluation methodology; equipment and process modelling; temperature control; defects and diffusion associated with annealing; metallizations such as silicidation; novel processing of sol-gel and magnetic films; dielectric growth and deposition; and silicon or silicon-germanium film deposition.
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A. T. Fiory
J. C. Gelpey
F. Roozeboom Philips Research Laboratories, The Netherlands.

R. P. S. Thakur
M. C. Öztürk North Carolina State University.
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