Amorphous and Heterogeneous Silicon Thin Films: Fundamentals to Devices - 1999: Volume 557. MRS Proceedings

  • ID: 2129366
  • Book
  • 914 Pages
  • Cambridge University Press
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Applications requiring large-area semiconductor coverage rely increasingly on amorphous and heterogeneous silicon materials because they can be deposited at low cost on a variety of substrates. This volume, first published in 1999, covers the range from fundamental research to the device applications of these materials. A special session on medium-range order is featured, and confirms the belief that ordering correlates with the electronic quality of a-Si:H films. Important experimental observations on metastable effects in a-Si:H are also reported, as are devices and processing strategies. Topics include: growth and properties; high-rate deposition; recrystallization, amorphization and porous silicon; ordering and hydrogen; metastability; defects, band tails and transport; heterogeneous materials and devices; thin-film transistors and displays; solar cells; and detectors, imagers and other devices.
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Howard M. Branz National Renewable Energy Laboratory, Golden, Colorado.

Robert W. Collins Pennsylvania State University.

Hiroaki Okamoto University of Osaka, Japan.

Subhendu Guha
Ruud Schropp Universiteit Utrecht, The Netherlands.
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