+353-1-416-8900REST OF WORLD
+44-20-3973-8888REST OF WORLD
1-917-300-0470EAST COAST U.S
1-800-526-8630U.S. (TOLL FREE)

PRINTER FRIENDLY

Chemical Processing of Dielectrics, Insulators and Electronic Ceramics: Volume 606. MRS Proceedings

  • ID: 2129411
  • Book
  • 330 Pages
  • Cambridge University Press
1 of 2
This book focuses on the creative use of chemistry in the fabrication of a variety of oxide and non-oxide materials which are likely to play a crucial role in the development of the next generation of microelectronics devices. It includes inorganic precursor chemistry, gas-phase and solid-state chemistry, materials science, chemical physics and chemical engineering. Highlights include the deposition of high-k dielectric gate oxides, ferroelectric oxide films for infrared and memory applications, low-k dielectrics, TiN and TaN diffusion barriers, and fresh precursors for III-V nitrides. The emphasis is on chemical methods for the controlled deposition of thin films, for which chemical vapor deposition (CVD) has proven to be a useful and versatile technique. Of particular interest is the use of liquid-injection MOCVD for the deposition of oxide multilayers and superlattices. Solution deposition techniques such as sol-gel, metalorganic decomposition (MOD), hydrothermal processing are also prominently featured. Topics include: CVD of oxide ceramics; CVD of nonoxide ceramics; solution deposition of electronic ceramics; alternative chemical processing methods and characterization of electronic ceramics..
Note: Product cover images may vary from those shown
2 of 2

Loading
LOADING...

3 of 2
Anthony C. Jones University of Liverpool.

Janice Veteran
Donald Mullin
Reid Cooper University of Wisconsin, Madison.

Sanjeev Kaushal
Note: Product cover images may vary from those shown
Adroll
adroll