Amorphous and Heterogeneous Silicon-Based Films - 2002: Volume 715. MRS Proceedings

  • ID: 2129491
  • Book
  • 832 Pages
  • Cambridge University Press
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This book on amorphous silicon technology shows a trend towards technologies based on amorphous and heterogeneous silicon (solar cells, TFTs, imaging arrays, sensors, etc.) and brings together researchers from around the world to share their expanding expertise. The book contains eleven chapters and focuses on basic mechanisms of growth (as well as new approaches to film growth); hot wire, CVD-produced amorphous and microcrystalline films and related subjects of film crystallization and recrystallization; the electronic structure and transport properties of silicon-based thin films are discussed, together with hydrogen microstructure and metastability. Silicon nitride, four on alloys with germanium, and two dealing predominantly with silicon carbide are looked at. There is also focus on photovoltaic devices based on either amorphous or microcrystalline (or mixed phase) materials. It also offers a look at thin-film transistors, as well as related types of imaging and sensing arrays and there are papers on novel device structures and new types of technologies being developed using amorphous/heterogeneous thin film, silicon-based materials.
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J. David Cohen University of Oregon.

John R. Abelson University of Illinois, Urbana-Champaign.

Hideki Matsumura
John Robertson University of Cambridge.
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