Starting with the fundamentals of electrical measurements on semiconductor interfaces, it then describes the importance of controlling macroscopic electrical properties by atomic–scale techniques. Subsequent chapters present the wide range of surface and interface techniques available to characterize electronic, optical, chemical, and structural properties of electronic materials, including semiconductors, insulators, nanostructures, and organics. The essential physics and chemistry underlying each technique is described in sufficient depth with references to the most authoritative sources for more exhaustive discussions, while numerous examples are provided throughout to illustrate the applications of each technique.
With its general reading lists, extensive citations to the text, and problem sets appended to all chapters, this is ideal for students of electrical engineering, physics and materials science. It equally serves as a reference for physicists, material science and electrical and electronic engineers involved in surface and interface science, semiconductor processing, and device modeling and design.
This is a coproduction of Wiley and IEEE.
2. Historical Background
3. Electrical Measurements
4. Interface states
5. Ultrahigh vacuum technology
6. Surface and interface analysis
7. Photoemission spectroscopy
8. Photoemission with soft X–rays
9. Particle–solid scattering
10. Electron energy loss spectroscopy
11. Rutherford backscattering spectrometry
12. Secondary ion mass spectrometry
13. Electron diffraction
14. Scanning tunneling microscopy
15. Optical spectroscopies
16. Cathodoluminescence spectroscopy
17. Electronic Materials′ Surfaces
18. Adsorbates on Electronic Materials′ Surfaces
19. Adsorbate–Semiconductor Sensors
21. Metals on semiconductors
22. The future of interfaces