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Handbook of Plasma Immersion Ion Implantation and Deposition

  • ID: 2181037
  • Book
  • 760 Pages
  • John Wiley and Sons Ltd
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This is the first book to describe a family of plasma techniques used to modify the surface and near–surface layer of solid materials.
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Introduction (J. Conrad).

FUNDAMENTALS.

Fundamentals of Plasmas and Sheaths (M. Lieberman).

Ion Implantation and Thin–Film Deposition (M. Nastasi, et al.).

Fundamentals of Plasma Immersion Ion Implantation and Deposition (B. Wood, et al.).

Materials Characterization and Testing Methods–A Brief Survey (K. Walter, et al.).

TECHNOLOGY.

Design of a PIII&D Processing Chamber (J. Matossian, et al.).

Plasma Sources (A. Anders, et al.).

Pulser Technology (D. Goebel, et al.).

Health and Safety Issues Related to PIII&D (D. Beals, et al.).

APPLICATIONS.

Nonsemiconductor Applications of PIII&D (K. Sridharan, et al.).

Semiconductor Applications (P. Chu, et al.).

Appendices.

Index.
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André Anders
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