Developments in Surface Contamination and Cleaning, Volume 7

  • ID: 3336107
  • Book
  • 206 Pages
  • Elsevier Science and Technology
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As device sizes in the semiconductor industries are shrinking, they become more vulnerable to smaller contaminant particles, and most conventional cleaning techniques employed in the industry are not as effective at smaller scales. The book series Developments in Surface Contamination and Cleaning as a whole provides an excellent source of information on these alternative cleaning techniques as well as methods for characterization and validation of surface contamination. Each volume has a particular topical focus, covering the key techniques and recent developments in the area. The chapters in this Volume address the sources of surface contaminants and various methods for their collection and characterization, as well as methods for cleanliness validation. Regulatory aspects of cleaning are also covered. The collection of topics in this book is unique and complements other volumes in this series. Edited by the leading experts in small-scale particle surface contamination, cleaning and cleaning control, these books will be an invaluable reference for researchers and engineers in R&D, manufacturing, quality control and procurement specification situated in a multitude of industries such as: aerospace, automotive, biomedical, defense, energy, manufacturing, microelectronics, optics and xerography. 

  • Provides a state-of-the-art survey and best-practice guidance for scientists and engineers engaged in surface cleaning or handling the consequences of surface contamination
  • Addresses the continuing trends of shrinking device size and contamination vulnerability in a range of industries, spearheaded by the semiconductor industry and others
  • Includes new regulatory aspects
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1 Sources and Generation of Surface Contaminants (Rajiv Kohli)
2 Particle Counting (John Mitchell)
3 Optically Stimulated Electron Emission (Mantosh Chawla)
4 Grazing Angle FTIR for Cleanliness Validation (Mary Thomson)
5 Test Verification of Medical Device Cleanliness (David Albert)
6 Cleaning Validation and its Regulatory Aspects in the Pharmaceutical Industry (S. Lakshmana Prabu)
7 Environmental and Regulatory Aspects of Green Cleaning (Jason Marshall)
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Kohli, Rajiv
NASA Johnson Space Center -Rajiv Kohli is a leading expert in contaminant particle behaviour, surface cleaning and contamination control. At the NASA Johnson Space Center he has primary responsibility for contamination control related to spaceflight hardware for the Space Shuttle, the International Space Station, and the new Constellation Program (designed to meet the United States Vision for Space Exploration). He helped to develop solvent-based cleaning applications for the nuclear industry and an innovative microabrasive system for a wide variety of applications in the commercial sector. He co-authored Commercial Utilization of Space: An International Comparison of Framework Conditions, and has published over 200 technical papers. His other specialisms include precision cleaning, solution and surface chemistry, advance materials and chemical thermodynamics. In 2005, Dr. Kohli received the Public Service Medal, one of NASA's highest awards, for contributions to the Space Shuttle Return to Flight project.
Mittal, Kashmiri L.
Editor: 'Reviews of Adhesion and Adhesives'

was associated with IBM from 1972 to 1994. Currently, he is teaching and consulting in the areas of adhesion science and technology and in surface contamination and cleaning. He is the founding editor of the Journal of Adhesion Science and Technology and is editor of 85 books, many of them dealing with surface contamination and cleaning. In 2002, the Kash Mittal Award was inaugurated for his extensive efforts and significant contributions to the field of colloid and interface chemistry. Among his numerous awards, Dr. Mittal was awarded the title honoris causa by the Maria Curie-Sklodowska University in Lubin, Poland in 2003.

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