Surface passivation of solar cells is a technology for preventing electrons and ions, that have been generated by photons and are supposed to form the photovoltaic current, to recombine prematurely with one another. It thus increases the cell's energy conversion efficiencies and reduces the cost per kWh generated by a PV system.
In the past few years, new tools have been developed to ensure low cost of ownership for high volume production of passivated cells. Different deposition techniques (ALD, PECVD, APCVD) and different materials (SiOx, AlOx, SiNx) have been tested during the development process of more than 10 years. Now, solar cell manufacturing industry is picking up the concept of rear side passivation. The next generation solar cells in production will be the PERC (Passivated Emitter and Rear Cell) type using all the reported achievements including novel tool concepts and process technologies.
This timely overview of solar cell surface passivation is a key read for researchers working with solar cells, as well as solar cell manufacturers.
- Chapter 1: Market Position of PERC Silicon Solar Cells
- Chapter 2: Introduction to Surface Passivation of Industrial Crystalline Silicon Solar Cells
- Chapter 3: Material Properties of AIOx for Silicon Surface Passivation
- Chapter 4: Material Properties of Al2O3 grown on Si: interface trap density (Dit) and fixed charge density (Qf)
- Chapter 5: PECVD-AlOx
- Chapter 6: Atmospheric Pressure Chemical Vapor Deposition of Aluminium Oxide for Silicon Surface Passivation
- Chapter 7: Al2O3 by atmospheric pressure chemical vapour deposition
- Chapter 8: Surface Passivation of Industrial PERC Solar Cells
- Chapter 9: Al2O3 passivation in industrial solar cells: n-PERT
- Chapter 10: Double-layer dielectric stacks for advanced surface passivation of crystalline silicon solar cells
- Chapter 11: Hydrogenated silicon nitride (SiNx:H) as surface passivation layer
- Chapter 12: Microwave PE CVD Reactor and Process for industrial high throughput fabrication ofAluminum Oxide Layersfor solar cell applications
- Chapter 13: Spatial Atomic Layer Deposition of Al2O3: Levitrack, a one-pass ALD system with throughputs exceeding 6000 wafers/hr
- Chapter 14: Spatial Al2O3 ALD: From Lab to Fab
Joachim John is a Management Team member and Program Manager in the PV department of the Interuniversity Micro Electronic Centre (IMEC) in Belgium. He is Session Chairman, Scientific Committee member and Organizing Committee member of the EU PVSEC, IEEE PVSC, Si-PV/n-PV and the SNEC, respectively. He serves as reviewer for several journals. He has been expert team member of the PV Technology Platform of the European Commission since 2014. He has published more than 200 papers, given more than 40 invited presentations and holds 5 patents. In 2014 he was awarded with the Otto-von-Guericke medal of the University of Magdeburg by minister-president of Saxony-Anhalt Dr. Reiner Haseloff.