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EUV Lithography Market - Forecasts from 2019 to 2024

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    Report

  • 106 Pages
  • June 2019
  • Region: Global
  • Knowledge Sourcing Intelligence LLP
  • ID: 4801740
The global EUV lithography market is projected to grow at a CAGR of 35.38% to reach US$13,333.191 million by 2024, from US$2,165.510 million in 2018. EUV lithography is the advanced lithography technology which makes use of small wavelengths so as to create circuits to obtain higher resolution outputs. As per Moore’s law, the transistor density doubles every 24 months with the semiconductor manufacturers focusing on continuously shrinking the size of integrated circuit components. The chip manufacturers have already reduced the feature sizes to as small as 42 nm using 193-nm lithographic systems, however, it was accommodated with complex manufacturing techniques and the rising cost of chips. The ability of the EUV lithography to further allow the shrinkage at a relatively reduced cost has led to its gaining popularity. Simultaneously, rising expenditure on research and development activities so as to develop advanced circuits using EUV lithography technology will drive the demand for this market. However, the high cost of these devices will hinder the growing demand for these systems over the forecast period.

Drivers

Growing wafer manufacturing.

Ability to further reduce the chip size.

Restraints

High set up cost

Major industry players profiled as part of the report are ASML, Zeiss International, and SUSS MicroTec SE among others.

Segmentation

The global EUV lithography market has been analyzed through the following segments:

By End-User

Integrated Device Manufacturer
Foundry

By Geography

Americas
USA
Canada
Brazil
Others

Europe Middle East and Africa
United Kingdom
Germany
France
Israel
Others

Asia Pacific
Japan
China
Taiwan
South Korea
Others

Table of Contents

1. INTRODUCTION
1.1. Market Overview
1.2. Market Definition
1.3. Scope of the Study
1.4. Currency
1.5. Assumptions
1.6. Base, and Forecast Years Timeline
2. RESEARCH METHODOLOGY
2.1. Research Design
2.2. Secondary Sources
3. KEY FINDINGS
4. MARKET DYNAMICS
4.1. Market Segmentation
4.2. Market Drivers
4.3. Market Restraints
4.4. Market Opportunities
4.5. Porter's Five Forces Analysis
4.5.1. Bargaining Power of Suppliers
4.5.2. Bargaining Power of Buyers
4.5.3. Threat of New Entrants
4.5.4. Threat of Substitutes
4.5.5. Competitive Rivalry in the Industry
4.6. Life Cycle Analysis - Regional Snapshot
4.7. Market Attractiveness
5. GLOBAL EUV LITHOGRAPHY MARKET BY END-USER
5.1. Integrated Device Manufacturer
5.2. Foundry
6. GLOBAL EUV LITHOGRAPHY MARKET BY GEOGRAPHY
6.1. Americas
6.1.1. USA
6.1.2. Canada
6.1.3. Brazil
6.1.4. Others
6.2. Europe Middle East and Africa
6.2.1. United Kingdom
6.2.2. Germany
6.2.3. France
6.2.4. Israel
6.2.5. Others
6.3. Asia Pacific
6.3.1. Japan
6.3.2. China
6.3.3. Taiwan
6.3.4. South Korea
6.3.5. Others
7. COMPETITIVE INTELLIGENCE
7.1. Competitive Benchmarking and Analysis
7.2. Recent Investments and Deals
7.3. Strategies of Key Players
8. COMPANY PROFILES
8.1. ASML
8.2. Zeiss International
8.3. SUSS MicroTec SE
8.4. Toppan Printing Co., Ltd.
8.5. NTT Advanced Technology Corporation

Companies Mentioned

  • ASML
  • Zeiss International
  • SUSS MicroTec SE
  • Toppan Printing Co., Ltd.
  • NTT Advanced Technology Corporation

Methodology

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