Global Photomask Inspection Market 2017-2021

  • ID: 4211569
  • Report
  • Region: Global
  • 70 pages
  • TechNavio
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FEATURED COMPANIES

  • Applied Materials
  • Carl Zeiss
  • Hermes Microvision
  • JEOL
  • KLA-Tencor
  • Lasertec
  • MORE
Mask inspection or photomask inspection is an operation of checking the accuracy of fabricated photomasks that are used in semiconductor device fabrication. In the semiconductor industry, photomask inspection is a series of electronic data that lays the foundation for lithography steps of the semiconductor device fabrication process. Photomask inspection is a method used before lithography to inspect photomasks for defects during the production of semiconductor wafers and is also used for R&D.

The analysts forecast the global photomask inspection market to grow at a CAGR of 7.05% during the period 2017-2021.

Covered in this report

The report covers the present scenario and the growth prospects of the global photomask inspection market for 2017-2021. To calculate the market size, the report presents a detailed picture of the market by way of study, synthesis, and summation of data from multiple sources.

The market is divided into the following segments based on geography:
- Americas
- APAC
- EMEA

The report, Global Photomask Inspection Market 2017-2021, has been prepared based on an in-depth market analysis with inputs from industry experts. The report covers the market landscape and its growth prospects over the coming years. The report also includes a discussion of the key vendors operating in this market.

Key vendors
- KLA-Tencor
- Applied Materials
- Lasertec

Other prominent vendors
- Carl Zeiss
- FEI (a subsidiary of Thermo Fisher Scientific)
- Hermes Microvision
- JEOL
- Nanometrics
- Nikon
- Planar
- Rudolph Technologies

Market drivers
- Increase in number of fabs
- For a full, detailed list, view the full report

Market challenges
- Increased inventory levels in supply chain
- For a full, detailed list, view the full report

Market trends
- Increase in wafer size
- For a full, detailed list, view the full report

Key questions answered in this report
- What will the market size be in 2021 and what will the growth rate be?
- What are the key market trends?
- What is driving this market?
- What are the challenges to market growth?
- Who are the key vendors in this market space?
- What are the market opportunities and threats faced by the key vendors?
- What are the strengths and weaknesses of the key vendors?

You can request one free hour of the analyst’s time when you purchase this market report. Details are provided within the report.
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2 of 5

FEATURED COMPANIES

  • Applied Materials
  • Carl Zeiss
  • Hermes Microvision
  • JEOL
  • KLA-Tencor
  • Lasertec
  • MORE
PART 01: Executive summary

PART 02: Scope of the report

PART 03: Research Methodology

PART 04: Introduction
  • Key market highlights
  • Photomask inspection: Overview
PART 05: Market landscape

PART 06: Market overview
  • Technology type
  • End-users
  • Market size and forecast
  • Five forces analysis
PART 07: Market segmentation by technology type
  • Market overview
  • Global photomask inspection market by optical inspection
  • Global photomask inspection market by e-beam inspection
PART 08: Market segmentation by end-user
  • Market overview
  • Global photomask inspection market by foundries
  • Global photomask inspection market by IDMs
PART 09: Geographical segmentation
  • Market overview
  • Photomask inspection market in APAC
  • Photomask inspection market in Americas
  • Photomask inspection market in EMEA
PART 10: Key leading countries
  • Market overview
  • US
  • South Korea
  • Taiwan
  • Japan
PART 11: Market drivers
  • Increase in number of fabs
  • Growth of wireless computing devices
  • Demand for SoC technology
  • Rising demand for IoT
PART 12: Impact of drivers

PART 13: Market challenges
  • High initial capital investments
  • Increased inventory levels in supply chain
  • High dependency on few suppliers
  • Increasing complexity of photomask manufacturing process
PART 14: Impact of drivers and challenges

PART 15: Market trends
  • Increase in wafer size
  • Constant decrease in lithography wavelength
  • Growing demand for memory devices
  • Proliferation of wearable devices
  • Shorter replacement cycles of electronic gadgets
PART 16: Vendor landscape
  • Competitive scenario
  • Other prominent vendors
PART 17: Key vendor analysis
  • KLA-Tencor
  • Applied Materials
  • Lasertec
PART 18: Appendix
  • List of abbreviations
List of Exhibits

Exhibit 01: Global photomask inspection market: Overview
Exhibit 02: Global photomask inspection market 2016-2021 ($ millions)
Exhibit 03: Five forces analysis
Exhibit 04: Global photomask inspection market by technology type 2016-2021 (% share)
Exhibit 05: Global photomask inspection market by optical inspection 2016-2021 ($ millions)
Exhibit 06: Global photomask inspection market by e-beam inspection 2016-2021 ($ millions)
Exhibit 07: Global photomask inspection market by end-users 2016-2021 (% revenue share)
Exhibit 08: Global photomask inspection market by foundries 2016-2021 ($ millions)
Exhibit 09: Global photomask inspection market by IDMs 2016-2021 ($ millions)
Exhibit 10: Global photomask inspection market by region 2016-2021 (% revenue share)
Exhibit 11: Photomask inspection market in APAC 2016-2021 ($ millions)
Exhibit 12: Photomask inspection market in Americas 2016-2021 ($ millions)
Exhibit 13: Photomask inspection market in EMEA 2016-2021 ($ millions)
Exhibit 14: Global photomask inspection market: Key leading countries
Exhibit 15: Construction plans of fabs
Exhibit 16: Market share of wafers by size: 2016-2021 (%)
Exhibit 17: Impact of drivers
Exhibit 18: Impact of drivers and challenges
Exhibit 19: Evolution of wafer size
Exhibit 20: CAGR of 3D NAND and DRAM 2016-2021
Exhibit 21: Other prominent vendors
Exhibit 22: Recent developments
Exhibit 23: Recent developments
Exhibit 24: Recent developments
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FEATURED COMPANIES

  • Applied Materials
  • Carl Zeiss
  • Hermes Microvision
  • JEOL
  • KLA-Tencor
  • Lasertec
  • MORE
New Report Released: - Global Photomask Inspection Market 2017-2021

The author of the report recognizes the following companies as the key players in the global photomask inspection market: KLA-Tencor, Applied Materials and Lasertec.

Other Prominent Vendors in the market are: Carl Zeiss, FEI (a subsidiary of Thermo Fisher Scientific), Hermes Microvision, JEOL, Nanometrics, Nikon, Planar and Rudolph Technologies.

Commenting on the report, an analyst from the research team said: “One trend in the market is increase in wafer size. A wafer is known as a slice or substrate. It is a thin substrate of semiconductor material, such as crystalline silicon and is used for the fabrication of ICs and photovoltaics for conventional, wafer-based solar cells. Silicon wafers are essential for the fabrication of ICs.”

According to the report, one driver in the market is growth of wireless computing devices. The growth of mobile computing devices has fueled the growth of the global photomask inspection market. Consumers electronics such as smartphones, laptops, and notebooks are in demand. They are becoming lighter, slimmer, and more reliable. They are the highest contributors to the revenue of the global photomask inspection market, which is expected to continue during the forecast period. The growing demand for consumer electronics is directly proportional to increase in the rate of adoption of photomask inspection.

Further, the report states that one challenge in the market is increased inventory levels in supply chain. The semiconductor equipment industry is cyclical in nature, which affects the operating results of equipment vendors due to severe downturns during this period. The equipment manufacturers are faced with risks such as overcapacity, decreased demand, and increased price competition. Changes in customer requirements due to new manufacturing capacity and advances in technology affect equipment manufacturers considerably. The capital expenditure of semiconductor device manufacturers affects semiconductor manufacturing equipment vendors.

The study was conducted using an objective combination of primary and secondary information including inputs from key participants in the industry. The report contains a comprehensive market and vendor landscape in addition to a SWOT analysis of the key vendors.
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  • KLA-Tencor
  • Applied Materials
  • Lasertec
  • Carl Zeiss
  • FEI (a subsidiary of Thermo Fisher Scientific)
  • Hermes Microvision
  • JEOL
  • Nanometrics
  • Nikon
  • Planar
  • Rudolph Technologies
Note: Product cover images may vary from those shown
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Note: Product cover images may vary from those shown
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