Extreme Ultraviolet Lithography (EUVL) - Global Market Trajectory & Analytics

Global Extreme Ultraviolet Lithography (EUVL) Market to Reach $18 Billion by 2027

Amid the COVID-19 crisis, the global market for Extreme Ultraviolet Lithography (EUVL) estimated at US$3.8 Billion in the year 2020, is projected to reach a revised size of US$18 Billion by 2027, growing at a CAGR of 25.1% over the period 2020-2027. Integrated Device Manufacturers (IDM), one of the segments analyzed in the report, is projected to record 24.5% CAGR and reach US$13.4 Billion by the end of the analysis period. After an early analysis of the business implications of the pandemic and its induced economic crisis, growth in the Foundry segment is readjusted to a revised 27.1% CAGR for the next 7-year period.



The U.S. Market is Estimated at $1.1 Billion, While China is Forecast to Grow at 24.5% CAGR

The Extreme Ultraviolet Lithography (EUVL) market in the U.S. is estimated at US$1.1 Billion in the year 2020. China, the world's second largest economy, is forecast to reach a projected market size of US$3.1 Billion by the year 2027 trailing a CAGR of 24.5% over the analysis period 2020 to 2027. Among the other noteworthy geographic markets are Japan and Canada, each forecast to grow at 22.4% and 21.5% respectively over the 2020-2027 period. Within Europe, Germany is forecast to grow at approximately 17.7% CAGR.

Select Competitors (Total 38 Featured):

• ASML B.V.
• Canon, Inc.
• Carl Zeiss A/S
• Globalfoundries Inc.
• Intel Corporation
• Nikon Corporation
• NTT Advanced Technology Corporation
• Samsung Electronics Co., Ltd.
• SK Hynix, Inc.
• Toppan Printing Co., Ltd.
• Toshiba Corporation
• TSMC Ltd.