The semiconductor industry is continuously witnessing transition such as miniaturization of nodes and wafer sizes. The rise in demand for increasing wafer sizes into ultra-large-scale integration fabrication technology fosters the growth of the lithography metrology equipment market globally. Lithography metrology is a front-end process in semiconductor industry, which is used in fabrication. This makes it one of the most essential process in wafer fabrication and scaling.
The lithography metrology equipment market is expected to provide promising growth prospects throughout the forecast period, owing to emerging trends toward increased wafer sizes, high demand for miniature electronic devices, and developments in advanced metrology techniques. The recent business scenario has witnessed an upsurge in usage of metrology equipment across various industry verticals. Companies are now adopting efficient techniques to provide consumers with innovated and cost-efficient products.
The key factors that drive the growth of the lithography metrology equipment includes high demand for miniaturized electronic devices, increase in trends toward Internet of Things, and development in wafer size trends. However, high operational & maintenance cost of metrology equipment and metrology challenges prevailing for complex IC devices hampers the market growth to a certain extent. Furthermore, increase in advancements in advanced metrology techniques offers lucrative opportunities for the market growth globally.
The lithography metrology equipment market is categorized on the basis of technology, product, application and region. Depending on technology, the market is classified into critical-dimension scanning electron microscope (CD-SEM), optical critical dimension metrology (OCD), overlay control, and others. By product, the market is analyzed across chemical control equipment, gas control equipment, and others. By application, the market comprises of quality control & inspection, reverse engineering, virtual simulation, and others. Based on region, the market is studied across North America, Europe, Asia-Pacific, and LAMEA, along with its prominent countries.
The key players profiled in the lithography metrology equipment market include Hitachi High Technologies Corporation, ASML, Advantest Corporation, KLA-Corporation, NOVA, Nanometrics, Mikon Metrology NV, Canon Inc., Tokyo Electron Limited, and Applied Materials Inc.
These key players have adopted strategies, such as product portfolio expansion, mergers & acquisitions, agreements, geographical expansion, and collaborations to enhance their market penetration.
KEY BENEFITS FOR STAKEHOLDERS
GLOBAL LITHOGRAPHY METROLOGY EQUIPMENT MARKET SEGMENTATION
BY TECHNOLOGY:
BY PRODUCT:
BY APPLICATION:
BY GEOGRAPHY
The lithography metrology equipment market is expected to provide promising growth prospects throughout the forecast period, owing to emerging trends toward increased wafer sizes, high demand for miniature electronic devices, and developments in advanced metrology techniques. The recent business scenario has witnessed an upsurge in usage of metrology equipment across various industry verticals. Companies are now adopting efficient techniques to provide consumers with innovated and cost-efficient products.
The key factors that drive the growth of the lithography metrology equipment includes high demand for miniaturized electronic devices, increase in trends toward Internet of Things, and development in wafer size trends. However, high operational & maintenance cost of metrology equipment and metrology challenges prevailing for complex IC devices hampers the market growth to a certain extent. Furthermore, increase in advancements in advanced metrology techniques offers lucrative opportunities for the market growth globally.
The lithography metrology equipment market is categorized on the basis of technology, product, application and region. Depending on technology, the market is classified into critical-dimension scanning electron microscope (CD-SEM), optical critical dimension metrology (OCD), overlay control, and others. By product, the market is analyzed across chemical control equipment, gas control equipment, and others. By application, the market comprises of quality control & inspection, reverse engineering, virtual simulation, and others. Based on region, the market is studied across North America, Europe, Asia-Pacific, and LAMEA, along with its prominent countries.
The key players profiled in the lithography metrology equipment market include Hitachi High Technologies Corporation, ASML, Advantest Corporation, KLA-Corporation, NOVA, Nanometrics, Mikon Metrology NV, Canon Inc., Tokyo Electron Limited, and Applied Materials Inc.
These key players have adopted strategies, such as product portfolio expansion, mergers & acquisitions, agreements, geographical expansion, and collaborations to enhance their market penetration.
KEY BENEFITS FOR STAKEHOLDERS
- This study includes the analytical depiction of the global lithography metrology equipment market forecast along with the current trends and future estimations to determine the imminent investment pockets.
- The report presents information regarding the key drivers, restraints, and opportunities in the optical fiber and plastic conduit market.
- The lithography metrology equipment market growth is quantitatively analyzed from 2018 to 2026 to highlight the financial competency of the industry.
- Porter’s five forces analysis illustrates the potency of the buyers and suppliers in the industry.
GLOBAL LITHOGRAPHY METROLOGY EQUIPMENT MARKET SEGMENTATION
BY TECHNOLOGY:
- Critical Dimension Scanning Electron Microscope (CD-SEM)
- Optical Critical Dimension Metrology (OCD)
- Overlay Control
- Others
BY PRODUCT:
- Chemical Control Equipment
- Gas Control Equipment
- Others
BY APPLICATION:
- Quality Control & Inspection
- Reverse Engineering
- Virtual Simulation
- Others
BY GEOGRAPHY
- North America
- U.S.
- Canada
- Mexico
- Europe
- UK
- Germany
- France
- Russia
- Rest of Europe
- Asia-Pacific
- China
- Japan
- Taiwan
- South Korea
- Rest of Asia-Pacific
- LAMEA
- Latin America
- Middle East
- Africa
Table of Contents
Chapter 1: Introduction
Chapter 2: Executive Summary
Chapter 3: Market Overview
Chapter 4: Lithography Metrology Equipment Market, By Technology
Chapter 5: Lithography Metrology Equipment Market, By Product
Chapter 6: Lithography Metrology Equipment Market, By Application
Chapter 7: Lithography Metrology Equipment Market, By Region
Chapter 8: Company Profiles
Executive Summary
According to the report titled,'Lithography Metrology Equipment Market by Technology, Product, Connectivity, and Application: Global Opportunity Analysis and Industry Forecast, 2018-2026', the global market was valued at $382.6 million in 2018, and is projected to reach $681.4 million by 2026, registering a CAGR of 7.2% from 2019 to 2026.Metrology and inspection are important for the measurement of the semiconductor manufacturing process. This process is established at critical point of semiconductor manufacturing process to ensure accurate yield. Lithography metrology equipment are used for various factors such as critical dimension measurement, imaging of wafer patterns using photoresist, defect analysis, pattern process development, and material screening. A major restraint, which affects the lithography metrology market is rapid advancement of patterning technology, which increases its overall cost.
A critical dimension scanning electron microscope (CD-SEM) is a dedicated system for measuring the dimensions of the fine patterns formed on a semiconductor wafer. CD-SEM is mainly used in the manufacturing lines of electronic devices of semiconductors. A scanning electron microscope, or SEM, takes measurements by sending out an electron beam, which interacts with electrons in the material being scanned. This sends back signals, which are mapped by the equipment. The more critical dimensions that need to be mapped, the greater the amount of data that needs to be processed and stored.
Critical dimension scanning electron microscope has certain limitations in lithography metrology equipment market. This technology is capable of measuring traditional mast shapes, but it experiences certain hindrances during the metrology of complex patterns and shapes on the semiconductor mask or wafers. In addition, CD-SEM files are measured in tens or hundreds of gigabytes, which requires large data that makes the metrology process complex and stringent as large quantity of data cannot be processed within a reasonable time frame.
Asia-Pacific has a considerable share in the lithography metrology equipment market growth and is expected to be the fastest growing regional segment in the near future, with the highest CAGR. With an increase in demand for high voltage operating devices, organizations across verticals are realizing the importance of driver IC to ensure power management. High demand for automated switching devices and power modules is expected to be the key trend that is anticipated to influence the lithography metrology equipment market growth. In addition, emerging countries such as India, Philippines, and others are expected to offer lucrative opportunities for the growth of the market. According to lithography metrology equipment market trends, India has a very fast-growing electronics system design manufacturing (ESDM) industry. India also has a strong design base with more than 120 units. According to the Department of Electronics and Information Technology (DEITY), nearly 2,000 chips are being designed every year in India and more than 20,000 engineers are working on various aspects of chip design and verification.
China is highly dependent on foreign technology in its semiconductor industry, importing 90% of its chips to power its fast-growing economy. According to the Wall Street Journal, China is close to finalizing a $47 billion investment fund that would finance semiconductor research and chip startup development, which is expected to propel the growth of the market. China has the presence of some major manufacturing and fabrication plants such as ASMC, Beilling, Huahong Grace, TI, and others, which creates lucrative lithography metrology equipment market opportunity.
Key Finding of The Lithography Metrology Equipment Market:
Based on technology, the CD-SEM segment generated the highest revenue in the global lithography metrology equipment market in 2018.
Based on industry, the chemical control equipment segment generated the highest revenue in the lithography metrology equipment market share in 2018.
Based on application, the quality control and inspection segment generated the highest revenue in the lithography metrology equipment market forecast in 2018.
The key players profiled in the lithography metrology equipment market analysis include Hitachi High Technologies Corporation, ASML, Advantest Corporation, KLA-Corporation, NOVA, Nanometrics, Mikon Metrology NV, Canon Inc., Tokyo Electron Limited, and Applied Materials Inc. These key players adopt several strategies such as, new product launch and development, acquisition, partnership and collaboration and business expansion to increase the lithography metrology equipment market share during the forecast period.
Companies Mentioned
- Hitachi High Technologies Corporation
- ASML
- Advantest Corporation
- KLA-Corporation
- NOVA
- Nanometrics
- Mikon Metrology NV
- Canon Inc.
- Tokyo Electron Limited
- Applied Materials Inc.
Methodology
The analyst offers exhaustive research and analysis based on a wide variety of factual inputs, which largely include interviews with industry participants, reliable statistics, and regional intelligence. The in-house industry experts play an instrumental role in designing analytic tools and models, tailored to the requirements of a particular industry segment. The primary research efforts include reaching out participants through mail, tele-conversations, referrals, professional networks, and face-to-face interactions.
They are also in professional corporate relations with various companies that allow them greater flexibility for reaching out to industry participants and commentators for interviews and discussions.
They also refer to a broad array of industry sources for their secondary research, which typically include; however, not limited to:
- Company SEC filings, annual reports, company websites, broker & financial reports, and investor presentations for competitive scenario and shape of the industry
- Scientific and technical writings for product information and related preemptions
- Regional government and statistical databases for macro analysis
- Authentic news articles and other related releases for market evaluation
- Internal and external proprietary databases, key market indicators, and relevant press releases for market estimates and forecast
Furthermore, the accuracy of the data will be analyzed and validated by conducting additional primaries with various industry experts and KOLs. They also provide robust post-sales support to clients.
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