The global photoresist and photoresist ancillaries market was valued at US$ 3,393.0 million in 2018 and is projected to reach US$ 5,614.4 million by 2027; it is expected to grow at a CAGR of 5.8% from 2019 to 2027.
Photoresists are the light-sensitive polymeric resins that are mainly used in the production of printed circuit boards, printing plates, flat-panel liquid crystal displays, magnetic recording heads, and micro electromechanical systems (MEMS). These components serve as masking materials for the transferal of images into an underlying substrate via etching processes. Photoresist ancillaries are materials such as photoresist strippers, anti-reflective coatings, developers, and edge bead removers used along with photoresist. The photoresists and photoresist ancillaries are used in wiring configuration in multi-layered semiconductors for manufacturing computers, laptops, music players, phones, servers, and household appliances. The electronic industry is experiencing steady growth in the developed and developing countries. The companies operating in this field utilize the photoresist and photoresist ancillaries in the manufacture of products such as advanced telephones, computer systems, televisions and home entertainment equipment, and electronic control and monitoring devices used in many industrial and scientific applications.
Based on application, the photoresist and photoresist ancillaries market, is segmented into ArF immersion photoresist, ArF dry photoresist, KrF photoresist, and G-line and I-line photoresist. In 2018, the ArF immersion photoresist segment accounted for the largest share of the global photoresist and photoresist ancillaries market; however, the G-line and I-line photoresist segment is expected to grow at a higher CAGR during the forecast period. ArF Immersion are considered an excellent process window displaying critical dimension (CD) uniformity which allows better profile shape to the product. These products cater for the needs of the growing numbers of urban middle class consumers who are ready to pay premium price for photoresist and photoresist ancillaries.
Geographically, the Photoresist and Photoresist Ancillaries market is segmented into North America, Europe, Asia Pacific, South America, and the Middle East & Africa. In 2018, Asia Pacific held the largest share of the global photoresist and photoresist ancillaries market, followed by Europe. The photoresist and photoresist ancillaries’ industry in the countries of APAC has experienced a huge shift over the years. Asia Pacific is the largest continent in the world and is known for its chemicals products. The APAC encompasses an ample amount of opportunities for the growth of the photoresist and photoresist ancillaries market. The region has been noticed as one of the prominent markets for the utilization of photoresist and photoresist ancillaries. Asia has ranked highest among chemicals producing regions. China is dominating the regional market, followed by other countries such as Japan, Taiwan, Vietnam, Korea, Thailand, Malaysia, and Indonesia.
MERCK KGaA, Sumitomo Chemical Co., Ltd., TOKYO OHKA KOGYO CO., LTD., Micro Resist Technology GmbH, Shin-Etsu Chemical Co., Ltd, ALLRESIST GmbH, DJ Microlaminates, Inc., DuPont de Nemours, Inc., Fujifilm Corporation, JSR Corporation are among the major players present in the global photoresist and photoresist ancillaries market.
Overall size of the global photoresist and photoresist ancillaries market has been derived using primary and secondary sources. The research process begins with exhaustive secondary research using internal and external sources to obtain qualitative and quantitative information related to the global photoresist and photoresist ancillaries market. Also, multiple primary interviews were conducted with industry participants and commentators to validate and analyze the data. The participants who take part in such a process include industry expert such as VPs, business development managers, market intelligence managers, and national sales managers, and external consultants such as valuation experts, research analysts, and key opinion leaders specializing in the photoresist and photoresist ancillaries market.
Reasons to Buy:
Photoresists are the light-sensitive polymeric resins that are mainly used in the production of printed circuit boards, printing plates, flat-panel liquid crystal displays, magnetic recording heads, and micro electromechanical systems (MEMS). These components serve as masking materials for the transferal of images into an underlying substrate via etching processes. Photoresist ancillaries are materials such as photoresist strippers, anti-reflective coatings, developers, and edge bead removers used along with photoresist. The photoresists and photoresist ancillaries are used in wiring configuration in multi-layered semiconductors for manufacturing computers, laptops, music players, phones, servers, and household appliances. The electronic industry is experiencing steady growth in the developed and developing countries. The companies operating in this field utilize the photoresist and photoresist ancillaries in the manufacture of products such as advanced telephones, computer systems, televisions and home entertainment equipment, and electronic control and monitoring devices used in many industrial and scientific applications.
Based on application, the photoresist and photoresist ancillaries market, is segmented into ArF immersion photoresist, ArF dry photoresist, KrF photoresist, and G-line and I-line photoresist. In 2018, the ArF immersion photoresist segment accounted for the largest share of the global photoresist and photoresist ancillaries market; however, the G-line and I-line photoresist segment is expected to grow at a higher CAGR during the forecast period. ArF Immersion are considered an excellent process window displaying critical dimension (CD) uniformity which allows better profile shape to the product. These products cater for the needs of the growing numbers of urban middle class consumers who are ready to pay premium price for photoresist and photoresist ancillaries.
Geographically, the Photoresist and Photoresist Ancillaries market is segmented into North America, Europe, Asia Pacific, South America, and the Middle East & Africa. In 2018, Asia Pacific held the largest share of the global photoresist and photoresist ancillaries market, followed by Europe. The photoresist and photoresist ancillaries’ industry in the countries of APAC has experienced a huge shift over the years. Asia Pacific is the largest continent in the world and is known for its chemicals products. The APAC encompasses an ample amount of opportunities for the growth of the photoresist and photoresist ancillaries market. The region has been noticed as one of the prominent markets for the utilization of photoresist and photoresist ancillaries. Asia has ranked highest among chemicals producing regions. China is dominating the regional market, followed by other countries such as Japan, Taiwan, Vietnam, Korea, Thailand, Malaysia, and Indonesia.
MERCK KGaA, Sumitomo Chemical Co., Ltd., TOKYO OHKA KOGYO CO., LTD., Micro Resist Technology GmbH, Shin-Etsu Chemical Co., Ltd, ALLRESIST GmbH, DJ Microlaminates, Inc., DuPont de Nemours, Inc., Fujifilm Corporation, JSR Corporation are among the major players present in the global photoresist and photoresist ancillaries market.
Overall size of the global photoresist and photoresist ancillaries market has been derived using primary and secondary sources. The research process begins with exhaustive secondary research using internal and external sources to obtain qualitative and quantitative information related to the global photoresist and photoresist ancillaries market. Also, multiple primary interviews were conducted with industry participants and commentators to validate and analyze the data. The participants who take part in such a process include industry expert such as VPs, business development managers, market intelligence managers, and national sales managers, and external consultants such as valuation experts, research analysts, and key opinion leaders specializing in the photoresist and photoresist ancillaries market.
Reasons to Buy:
- Highlights key business priorities to assist companies realign their business strategies.
- Features key findings and crucial progressive industry trends in the global photoresist and photoresist ancillaries market, thereby allowing players to develop effective long-term strategies.
- Develops/modifies business expansion plans by using substantial growth offering from developed and emerging markets.
- Scrutinizes in-depth market trends as well as key market drivers and restraints.
- Enhances the decision-making process by understanding the strategies that underpin commercial interest with respect to products, segmentation, and industry verticals.
Table of Contents
1. Introduction
3. Research Methodology
4. Photoresist and Photoresist Ancillaries Market Landscape
5. Photoresist and Photoresist Ancillaries Market - Key Industry Dynamics
6. Photoresist and Photoresist Ancillaries Market - Global Market Analysis
7. Global Photoresist and Photoresist Ancillaries Market Analysis - By Photoresist Type
8. Global Photoresist and Photoresist Ancillaries Market Analysis - By Photoresist Ancillaries Type
9. Global Photoresist and Photoresist Ancillaries Market Analysis - By Application
10. Photoresist and Photoresist Ancillaries Market - Geographic Analysis
11. Overview- Impact of Covid-19 Outbreak
12. Industry Landscape
13. Key Company Profiles
14. Appendix
Companies Mentioned
A selection of companies mentioned in this report includes:
- ALLRESIST GmbH
- DJ Micro Laminates, Inc.
- DuPont de Nemours, Inc.
- FUJIFILM Holdings Corporation
- JSR Corporation
- Shin-Etsu Chemical Co., Ltd.
- Tokyo Ohka Kogyo Co., Ltd
- Micro Resist Technology GmbH
- Merck KGaA
- Sumitomo Chemical Co., Ltd.
