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Global High-k And CVD ALD Metal Precursors Market Size, Share & Industry Trends Analysis Report by Technology (Interconnect, Capacitors, and Gates), Regional Outlook and Forecast, 2022-2028

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    Report

  • 112 Pages
  • October 2022
  • Region: Global
  • Marqual IT Solutions Pvt. Ltd (KBV Research)
  • ID: 5694446
The Global High-k And CVD ALD Metal Precursors Market size is expected to reach $740.0 Million by 2028, rising at a market growth of 6.3% CAGR during the forecast period.

High-k is a substance with a high dielectric constant that has been the industry benchmark for the gate dielectric substrate of a device for a very long period of time, compared to silicon dioxide. Widespread usage of high-k dielectrics in the semiconductor production process has enabled the miniaturization of microelectronic components.



Both atomic layer deposition (ALD), as well as chemical vapor deposition (CVD) thin film deposition methods, utilize a chemical interaction between the material and the substrate to be deposited. Atomic layer deposition (ALD) is a thin-film deposition technology based on the successive usage of a form of chemical vapor deposition procedure employing two chemicals referred to as precursors or reactants that react with the material surface in a sequential, self-limiting manner.

ALD is a crucial step in the production of semiconductor devices and a tool in the arsenal for the synthesis of nanomaterials. The materials with high dielectric values are utilized for quick data access and storage. In addition to giving thickness control there at the Angstrom level, ALD enables excellent conformality of deposition in structures with large aspect ratios. Thin films made from high-k dielectric materials, like Al2O3, HfO2, Ta2O5, high-k gate oxides, ZrO2 for DRAM, and nitrides for electrodes and interconnects, are produced using the ALD process.

Atomic Layer Deposition (ALD) is a subcategory of the Chemical Vapor Deposition (CVD) technique, which is used to produce thin films. The ALD process is used to deposit multi-component thin films via co-injecting precursors, like Hf and Si, for the formation of a single-layer homogeneous film utilized in a variety of applications, including 3D NAND, self-aligned patterning, and FinFET.

COVID-19 Impact Analysis

This has disrupted the High-K and ALD CVD Metal Precursors market's overall supply chain. In contrast, the High-K and ALD CVD metal precursors business anticipates an opportunity to capitalize during the current economic downturn, as more organizations seek to employ remote workers and as end-users consume more material on digital platforms. This impacts the significance of memory and storage solutions for data laptops, centers, and other devices, such as small, cost-effective, high-powered packaged ICs and other semiconductor devices. After lockdown constraints are relaxed, it is estimated that semiconductor device component manufacturers would alter their sourcing strategy, production planning, and industry dynamics to drive growth.

Market Growth Factors

Rising Demand And Number Of Applications Of Nanotechnology

Nanotechnology is capable of self-replication, which is synonymous with exponential technology. It also signifies a production method, which means that manufacturers would be able to produce goods in a clean, inexpensive, and quick manner. In addition, in the field of Medicine, researchers have begun producing nanoparticles that are customized to the size of molecules in order to deliver medications directly to damaged cells. This strategy would minimize the damage caused by chemotherapy, which kills healthy cells in patients.

The Rapid Expansion Of The Semiconductor Sector All Over The World In Recent Years

As a result of the emergence of technologies such as artificial intelligence, the Internet of Things, and 5G, the development of data-driven solutions has expanded dramatically. Numerous businesses place a significant emphasis on research and development activities in order to build cutting-edge solutions based on such technology. There is an increase in demand for ICs to be embedded in devices as a result of the requirement to provide effective, sophisticated, and intelligent solutions.

Marketing Restraining Factor

Technical Challenges And Complexities In The Manufacturing Process

Manufacturing methods for semiconductors require hygienic facilities and equipment. Even a modest amount of dust can significantly hinder and degrade the process. Order cancellations and additional losses may result from delivery delays caused by production errors. Mechanical integrity difficulties, flaws in the raw materials, and chip-level problems typically impede the fabrication of semiconductors. Moreover, for the production of high-quality semiconductor devices along with integrated circuits (ICs), innovative and inventive techniques are necessary.



Technology Outlook

By Technology, the High-k And CVD ALD Metal Precursors Market is segregated into Interconnect, Capacitors, and Gates. In 2021, the gate segment garnered a substantial revenue share of the high-K and CVD ALD metal precursors market. Significant research has been done on the ALD approach for producing thin films from high-k dielectric conducting polymers. The combination of metal gate technologies and high-k dielectric allows a significant reduction in gate leakage for transistors with a thickness of one nanometer or less.

Regional Outlook

Region-Wise, the High-k And CVD ALD Metal Precursors Market is analyzed across North America, Europe, Asia-pacific, and LAMEA. In 2021, Asia-Pacific witnessed the largest revenue share of the high-K and ALD CVD dielectric metal precursors market. Due to factors such as China's significantly high demand for electronic items and continuing outsourcing of electronic device manufacture to China, it is anticipated that the region would grow significantly over the forecast duration.

The market research report covers the analysis of key stakeholders of the market. Key companies profiled in the report include Air Liquide S.A, Air Product & Chemicals, Inc., The Dow Chemical Company, Linde PLC, Merck KGAA, Samsung Electronics Co., Ltd., Nanmat Technology Co. Ltd., Adeka Corporation, Strem Chemicals, Inc., and Colnatec.

Scope of the Study

By Technology

  • Interconnect
  • Capacitors
  • Gates

By Geography

  • North America
    • US
    • Canada
    • Mexico
    • Rest of North America
  • Europe
    • Germany
    • UK
    • France
    • Russia
    • Spain
    • Italy
    • Rest of Europe
  • Asia Pacific
    • China
    • Japan
    • India
    • South Korea
    • Singapore
    • Malaysia
    • Rest of Asia Pacific
  • LAMEA
    • Brazil
    • Argentina
    • UAE
    • Saudi Arabia
    • South Africa
    • Nigeria
    • Rest of LAMEA

Key Market Players

List of Companies Profiled in the Report:

  • Air Liquide S.A
  • Air Product & Chemicals, Inc.
  • The Dow Chemical Company
  • Linde PLC
  • Merck KGAA
  • Samsung Electronics Co., Ltd.
  • Nanmat Technology Co. Ltd.
  • Adeka Corporation
  • Strem Chemicals, Inc.
  • Colnatec

Unique Offerings

  • Exhaustive coverage
  • The highest number of market tables and figures
  • Subscription-based model available
  • Guaranteed best price
  • Assured post sales research support with 10% customization free
Frequently Asked Questions about the Global High-k And CVD ALD Metal Precursors Market

What is the estimated value of the Global High-k And CVD ALD Metal Precursors Market?

The Global High-k And CVD ALD Metal Precursors Market was estimated to be valued at $487 Million in 2021.

What is the growth rate of the Global High-k And CVD ALD Metal Precursors Market?

The growth rate of the Global High-k And CVD ALD Metal Precursors Market is 6.3%, with an estimated value of $740 Million by 2028.

What is the forecasted size of the Global High-k And CVD ALD Metal Precursors Market?

The Global High-k And CVD ALD Metal Precursors Market is estimated to be worth $740 Million by 2028.

Who are the key companies in the Global High-k And CVD ALD Metal Precursors Market?

Key companies in the Global High-k And CVD ALD Metal Precursors Market include Air Liquide S.A, Air Product & Chemicals, Inc., The Dow Chemical Company, Linde PLC, Merck KGAA, Samsung Electronics Co., Ltd., Nanmat Technology Co. Ltd., Adeka Corporation, Strem Chemicals, Inc. and Colnatec.

Table of Contents

Chapter 1. Market Scope & Methodology
1.1 Market Definition
1.2 Objectives
1.3 Market Scope
1.4 Segmentation
1.4.1 Global High-k And CVD ALD Metal Precursors Market, by Technology
1.4.2 Global High-k And CVD ALD Metal Precursors Market, by Geography
1.5 Research Methodology
Chapter 2. Market Overview
2.1 Introduction
2.1.1 Overview
2.1.1.1 Market Composition and Scenario
2.2 Key Factors Impacting the Market
2.2.1 Market Drivers
2.2.2 Market Restraints
Chapter 3. Global High-k And CVD ALD Metal Precursors Market by Technology
3.1 Global Interconnect Market by Region
3.2 Global Capacitors Market by Region
3.3 Global Gates Market by Region
Chapter 4. Global High-k And CVD ALD Metal Precursors Market by Region
4.1 North America High-k And CVD ALD Metal Precursors Market
4.1.1 North America High-k And CVD ALD Metal Precursors Market by Technology
4.1.1.1 North America Interconnect Market by Country
4.1.1.2 North America Capacitors Market by Country
4.1.1.3 North America Gates Market by Country
4.1.2 North America High-k And CVD ALD Metal Precursors Market by Country
4.1.2.1 US High-k And CVD ALD Metal Precursors Market
4.1.2.1.1 US High-k And CVD ALD Metal Precursors Market by Technology
4.1.2.2 Canada High-k And CVD ALD Metal Precursors Market
4.1.2.2.1 Canada High-k And CVD ALD Metal Precursors Market by Technology
4.1.2.3 Mexico High-k And CVD ALD Metal Precursors Market
4.1.2.3.1 Mexico High-k And CVD ALD Metal Precursors Market by Technology
4.1.2.4 Rest of North America High-k And CVD ALD Metal Precursors Market
4.1.2.4.1 Rest of North America High-k And CVD ALD Metal Precursors Market by Technology
4.2 Europe High-k And CVD ALD Metal Precursors Market
4.2.1 Europe High-k And CVD ALD Metal Precursors Market by Technology
4.2.1.1 Europe Interconnect Market by Country
4.2.1.2 Europe Capacitors Market by Country
4.2.1.3 Europe Gates Market by Country
4.2.2 Europe High-k And CVD ALD Metal Precursors Market by Country
4.2.2.1 Germany High-k And CVD ALD Metal Precursors Market
4.2.2.1.1 Germany High-k And CVD ALD Metal Precursors Market by Technology
4.2.2.2 UK High-k And CVD ALD Metal Precursors Market
4.2.2.2.1 UK High-k And CVD ALD Metal Precursors Market by Technology
4.2.2.3 France High-k And CVD ALD Metal Precursors Market
4.2.2.3.1 France High-k And CVD ALD Metal Precursors Market by Technology
4.2.2.4 Russia High-k And CVD ALD Metal Precursors Market
4.2.2.4.1 Russia High-k And CVD ALD Metal Precursors Market by Technology
4.2.2.5 Spain High-k And CVD ALD Metal Precursors Market
4.2.2.5.1 Spain High-k And CVD ALD Metal Precursors Market by Technology
4.2.2.6 Italy High-k And CVD ALD Metal Precursors Market
4.2.2.6.1 Italy High-k And CVD ALD Metal Precursors Market by Technology
4.2.2.7 Rest of Europe High-k And CVD ALD Metal Precursors Market
4.2.2.7.1 Rest of Europe High-k And CVD ALD Metal Precursors Market by Technology
4.3 Asia Pacific High-k And CVD ALD Metal Precursors Market
4.3.1 Asia Pacific High-k And CVD ALD Metal Precursors Market by Technology
4.3.1.1 Asia Pacific Interconnect Market by Country
4.3.1.2 Asia Pacific Capacitors Market by Country
4.3.1.3 Asia Pacific Gates Market by Country
4.3.2 Asia Pacific High-k And CVD ALD Metal Precursors Market by Country
4.3.2.1 China High-k And CVD ALD Metal Precursors Market
4.3.2.1.1 China High-k And CVD ALD Metal Precursors Market by Technology
4.3.2.2 Japan High-k And CVD ALD Metal Precursors Market
4.3.2.2.1 Japan High-k And CVD ALD Metal Precursors Market by Technology
4.3.2.3 India High-k And CVD ALD Metal Precursors Market
4.3.2.3.1 India High-k And CVD ALD Metal Precursors Market by Technology
4.3.2.4 South Korea High-k And CVD ALD Metal Precursors Market
4.3.2.4.1 South Korea High-k And CVD ALD Metal Precursors Market by Technology
4.3.2.5 Singapore High-k And CVD ALD Metal Precursors Market
4.3.2.5.1 Singapore High-k And CVD ALD Metal Precursors Market by Technology
4.3.2.6 Malaysia High-k And CVD ALD Metal Precursors Market
4.3.2.6.1 Malaysia High-k And CVD ALD Metal Precursors Market by Technology
4.3.2.7 Rest of Asia Pacific High-k And CVD ALD Metal Precursors Market
4.3.2.7.1 Rest of Asia Pacific High-k And CVD ALD Metal Precursors Market by Technology
4.4 LAMEA High-k And CVD ALD Metal Precursors Market
4.4.1 LAMEA High-k And CVD ALD Metal Precursors Market by Technology
4.4.1.1 LAMEA Interconnect Market by Country
4.4.1.2 LAMEA Capacitors Market by Country
4.4.1.3 LAMEA Gates Market by Country
4.4.2 LAMEA High-k And CVD ALD Metal Precursors Market by Country
4.4.2.1 Brazil High-k And CVD ALD Metal Precursors Market
4.4.2.1.1 Brazil High-k And CVD ALD Metal Precursors Market by Technology
4.4.2.2 Argentina High-k And CVD ALD Metal Precursors Market
4.4.2.2.1 Argentina High-k And CVD ALD Metal Precursors Market by Technology
4.4.2.3 UAE High-k And CVD ALD Metal Precursors Market
4.4.2.3.1 UAE High-k And CVD ALD Metal Precursors Market by Technology
4.4.2.4 Saudi Arabia High-k And CVD ALD Metal Precursors Market
4.4.2.4.1 Saudi Arabia High-k And CVD ALD Metal Precursors Market by Technology
4.4.2.5 South Africa High-k And CVD ALD Metal Precursors Market
4.4.2.5.1 South Africa High-k And CVD ALD Metal Precursors Market by Technology
4.4.2.6 Nigeria High-k And CVD ALD Metal Precursors Market
4.4.2.6.1 Nigeria High-k And CVD ALD Metal Precursors Market by Technology
4.4.2.7 Rest of LAMEA High-k And CVD ALD Metal Precursors Market
4.4.2.7.1 Rest of LAMEA High-k And CVD ALD Metal Precursors Market by Technology
Chapter 5. Company Profiles
5.1 Merck Group
5.1.1 Company Overview
5.1.2 Financial Analysis
5.1.3 Segmental and Regional Analysis
5.1.4 Research & Development Expense
5.2 Samsung Electronics Co., Ltd. (Samsung Group)
5.2.1 Company Overview
5.2.2 Financial Analysis
5.2.3 Segmental and Regional Analysis
5.2.4 Research & Development Expense
5.2.5 SWOT Analysis
5.3 The Dow Chemical Company
5.3.1 Company Overview
5.3.2 Financial Analysis
5.3.3 Segmental and Regional Analysis
5.3.4 Research & Development Expenses
5.4 Air Products and Chemicals, Inc.
5.4.1 Company Overview
5.4.2 Financial Analysis
5.4.3 Segmental and Regional Analysis
5.4.4 Research & Development Expenses
5.5 Air Liquide S.A.
5.5.1 Company Overview
5.5.1 Financial Analysis
5.6 Linde PLC
5.6.1 Company Overview
5.6.2 Financial Analysis
5.6.3 Regional Analysis
5.6.4 Research & Development Expense
5.7 ADEKA Corporation
5.7.1 Company Overview
5.7.2 Financial Analysis
5.8 Nanmat Technology Co. Ltd.
5.8.1 Company Overview
5.9 Strem Chemicals, Inc. (Ascensus Specialties LLC)
5.9.1 Company Overview
5.10. Colnatec LLC
5.10.1 Company Overview

Companies Mentioned

  • Air Liquide S.A
  • Air Product & Chemicals, Inc.
  • The Dow Chemical Company
  • Linde PLC
  • Merck KGAA
  • Samsung Electronics Co., Ltd.
  • Nanmat Technology Co. Ltd.
  • Adeka Corporation
  • Strem Chemicals, Inc.
  • Colnatec

Methodology

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