Laser Photomask Market Report 2026

The laser photomask market size has grown steadily in recent years. It will grow from $3.78 billion in 2025 to $3.9 billion in 2026 at a compound annual growth rate (CAGR) of 3.2%. The growth in the historic period can be attributed to growth in semiconductor fabrication facilities, rising demand for consumer electronics, advancements in photolithography processes, increasing adoption of integrated circuits across industries, expansion of display manufacturing.

The laser photomask market size is expected to see steady growth in the next few years. It will grow to $4.45 billion in 2030 at a compound annual growth rate (CAGR) of 3.4%. The growth in the forecast period can be attributed to scaling down to sub-5nm semiconductor nodes, growing investments in advanced chip manufacturing, increasing use of EUV lithography, rising demand for high-performance computing chips, expansion of automotive and AI semiconductor applications. Major trends in the forecast period include increasing demand for advanced node semiconductor photomasks, rising adoption of EUV and DUV lithography masks, growing complexity of integrated circuit design patterns, expansion of high-precision mask writing technologies, increasing need for defect-free and high-yield photomasks.

The increasing demand for semiconductors is projected to drive the growth of the laser photomask market. Semiconductors are materials with intermediate electrical conductivity, which are essential for electronic devices due to their controllable conductivity and band structure. The rising demand for semiconductors is attributed to their critical role in powering advanced electronics, enabling faster processing, and fostering innovation across various technology sectors. Laser photomasks are integral to semiconductor manufacturing, as they project complex circuit patterns onto semiconductor wafers, facilitating precise etching and patterning of integrated circuits during photolithography. For example, in July 2024, the Semiconductor Industry Association, a US-based trade organization, reported that semiconductor sales reached $49.1 billion in May 2024, a 19.3% increase from $41.2 billion in May 2023. Thus, the growing demand for semiconductors is fueling the expansion of the laser photomask market.

Major companies operating in the laser photomask market are focusing on developing advanced solutions such as high numerical aperture (High-NA) EUV mask blank technology to enhance imaging performance and precision in semiconductor manufacturing. High-NA EUV mask blank technology improves pattern fidelity and reduces the shadowing effect that occurs during lithography, enabling superior image contrast and resolution for next-generation chips. For instance, in 2023, Hoya Corporation, a Japan-based photomask blank manufacturer, developed a new High-NA EUV mask blank as part of its smart factory initiative. The technology features a thinner absorber layer that minimizes the three-dimensional shadowing effect, advanced multilayer reflective coatings to increase EUV reflectivity, and improved flatness and defect control for reliable exposure performance.

In July 2024, Acrotec Group, a Switzerland-based supplier of watch components, acquired Lasertec B.V. for an undisclosed amount. This acquisition is intended to enhance Acrotec Group’s technological capabilities and expand its precision machining and laser cutting offerings. Lasertec, based in the Netherlands, specializes in laser-based photomask inspection systems for the semiconductor industry.

Major companies operating in the laser photomask market are Canon Inc., Applied Materials Inc., LG Innotek Co. Ltd., Toppan Printing Co. Ltd., KLA-Tencor Corporation, DAI Nippon Printing Co. Ltd., Hoya Corporation, Photronics Inc., Lasertec Corporation, Mycronic AB, SÜSS MicroTec Photomask Equipment GmbH, Taiwan Mask Corporation, Nippon Filcon Co. Ltd., SK-Electronics Co. Ltd., Vistec Electron Beam GmbH, Compugraphics, Heidelberg Instruments Mikrotechnik GmbH, HTA Photomask, Infinite Graphics Incorporated, Shin-Etsu MicroSi Inc.

Note that the outlook for this market is being affected by rapid changes in trade relations and tariffs globally. The report will be updated prior to delivery to reflect the latest status, including revised forecasts and quantified impact analysis. The report’s Recommendations and Conclusions sections will be updated to give strategies for entities dealing with the fast-moving international environment.

Tariffs have impacted the laser photomask market by increasing the cost of importing high-purity quartz substrates, advanced lithography equipment, and precision manufacturing tools. These impacts are most pronounced in semiconductor manufacturing hubs across Asia-Pacific, North America, and parts of Europe, where advanced node production is concentrated. Higher production costs and longer lead times have challenged photomask suppliers and chipmakers. However, tariffs have also encouraged domestic manufacturing investments and localized supply chains, strengthening regional photomask production capabilities over the long term.

The laser photomask market research report is one of a series of new reports that provides laser photomask market statistics, including laser photomask industry global market size, regional shares, competitors with a laser photomask market share, detailed laser photomask market segments, market trends, and opportunities, and any further data you may need to thrive in the laser photomask industry. This laser photomask research report delivers a complete perspective of everything you need, with an in-depth analysis of the current and future scenarios of the industry.

A laser photomask is a vital tool in semiconductor manufacturing for accurately transferring circuit patterns onto silicon wafers. It consists of a fused silica plate with areas that are opaque, transparent, or phase-shifting, and these patterns are projected onto wafers using deep ultraviolet (DUV) or extreme ultraviolet (EUV) light sources.

The main types of laser photomasks are reticles and masters. Reticles are used specifically in the photolithography process to transfer circuit patterns onto semiconductor wafers. They play a crucial role in integrated circuit production by enabling precise alignment and replication of complex designs at various scales. The different trade types include captive and merchant, and these photomasks are utilized in applications such as chips, liquid crystal displays, and printed circuit boards.Asia-Pacific was the largest region in the laser photomask market in 2025. Asia-Pacific is expected to be the fastest-growing region in the forecast period. The regions covered in the laser photomask market report are Asia-Pacific, South East Asia, Western Europe, Eastern Europe, North America, South America, Middle East, Africa. The countries covered in the laser photomask market report are Australia, Brazil, China, France, Germany, India, Indonesia, Japan, Taiwan, Russia, South Korea, UK, USA, Canada, Italy, Spain.

The laser photomask market consists of sales of transparent photomasks, phase shift masks, liquid crystal masks and membrane masks. Values in this market are ‘factory gate’ values, that is the value of goods sold by the manufacturers or creators of the goods, whether to other entities (including downstream manufacturers, wholesalers, distributors and retailers) or directly to end customers. The value of goods in this market includes related services sold by the creators of the goods.

The market value is defined as the revenues that enterprises gain from the sale of goods and/or services within the specified market and geography through sales, grants, or donations in terms of the currency (in USD unless otherwise specified).

The revenues for a specified geography are consumption values that are revenues generated by organizations in the specified geography within the market, irrespective of where they are produced. It does not include revenues from resales along the supply chain, either further along the supply chain or as part of other products.

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