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The Global Market for Glass Substrates for Semiconductors 2026-2036

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    Report

  • 275 Pages
  • September 2025
  • Region: Global
  • Future Markets, Inc
  • ID: 6171810

The glass substrate for semiconductors market represents one of the most significant material shifts in the packaging industry in decades, driven by the escalating demands of AI, high-performance computing (HPC), and advanced networking applications. This emerging market is transitioning glass from a background consumable to the core substrate material enabling next-generation chip architectures. The market is experiencing unexpected acceleration, with commercialization timelines moving ahead of initial projections. Recent industry events have highlighted the competitive intensity, particularly following speculation about potential partnerships between major players. SKC's stock price surged 44.4% in early 2025 after comments suggesting advanced negotiations with leading AI chip manufacturers, signaling investor confidence in near-term commercialization prospects. The momentum reflects growing recognition that glass substrates can deliver up to 40% speed improvements while reducing power consumption by half compared to conventional organic substrates. 

The surge in AI accelerators and HPC devices has created unprecedented demands for bandwidth density and power delivery that traditional organic substrates simply cannot support. Modern training accelerators require thousands of high-speed I/O bumps and power-delivery networks handling hundreds of amps with minimal noise. Glass substrates address these challenges through superior dimensional stability, ultra-low warpage, and the ability to support sub-2-micron interconnects with exceptional signal integrity. Glass substrates excel in heat and warpage resistance while enabling higher chip stacking densities on single substrates. The smoother surface allows ultra-fine circuit patterns, making them ideal for applications spanning carrier glass, IC substrates, interposers for multi-die packages, RF-MEMS applications, and photonic integration. Major semiconductor companies including Intel, AMD, and Broadcom have announced adoption plans for their next-generation chips.

Glass substrates offer compelling advantages over existing materials. Their coefficient of thermal expansion (CTE) matches silicon (3-7 ppm/°C), dramatically reducing thermomechanical stress in advanced packages. The dielectric constant is significantly lower than silicon (2.8 vs. 12), enabling superior high-frequency performance with orders of magnitude lower transmission losses. Manufacturing infrastructure is rapidly developing. Through-glass via (TGV) formation represents the core enabling technology, with multiple approaches including laser-induced deep etching (LIDE), direct laser drilling, and photosensitive glass processing. Leading equipment suppliers like LPKF, Canon, and Yield Engineering Systems are developing production-ready tools.

The glass substrate market emergence coincides with the industry's shift toward advanced packaging methodologies including chiplets, 2.5D/3D-IC integration, and heterogeneous system architectures. While organic substrates will continue serving mainstream applications, the accelerating timeline for glass commercialization suggests the high-performance segment transition may occur faster than initially anticipated. Success depends on continued yield improvements, cost reduction through scale, and ecosystem maturation. With AI/HPC growth driving performance requirements beyond organic substrate capabilities, glass substrates represent the critical enabler for continued semiconductor advancement, with commercial deployment potentially beginning as early as 2025-2026.

The Global Glass Substrate for Semiconductors Market 2026-2036 report provides critical insights for semiconductor manufacturers, substrate suppliers, equipment providers, and technology investors navigating this revolutionary transition. The report delivers comprehensive coverage across seven critical application segments: carrier and support glass, blank drilled core panels, finished IC substrates for single-die usage, finished interposers for multi-die packages, glass integrated passive devices (IPD), RF-MEMS applications, and photonic integration tiles. Each segment analysis includes detailed market forecasts, technology requirements, competitive positioning, and growth drivers specific to AI accelerators, data center infrastructure, 5G/6G communications, automotive electronics, and consumer devices.

Report contents include: 

  • Glass materials overview and semiconductor applications analysis
  • Market opportunities and value chain transformation from organic to glass substrates
  • Global market forecasts with unit shipment and revenue projections 2025-2036
  • Key advantages, adoption challenges, and future market trends
  • Advanced processing technologies and sustainable manufacturing initiatives
  • Investment priority areas and representative player activity assessment
  • Technology Fundamentals & Manufacturing
    • Glass materials properties: borosilicate, quartz, and specialty compositions
    • Manufacturing processes: glass melting, forming, and panel-level processing
    • Through Glass Via (TGV) formation technologies and metallization processes
    • Design considerations: thermal management, stress analysis, electrical optimization
    • Build-up layer fabrication and advanced manufacturing process development
  • Advanced Packaging & IC Substrates Analysis
    • Evolution from 1D to 4D advanced packaging architectures
    • Intel's roadmap, heterogeneous integration, and system-level packaging solutions
    • Glass IC substrate evolution and organic-to-glass core transition analysis
    • Comprehensive TGV technology coverage: formation, processing, metallization
    • Material property comparisons and performance benchmarking
    • Traditional substrate limitations and glass core substrate technologies
    • Industry implementation case studies and innovation analysis
  • Photonic Integration Applications
    • Photonic integrated circuits and co-packaged optics architecture
    • Glass waveguide technologies and ion exchange formation processes
    • EIC/PIC integration and optical coupling solutions
    • Manufacturing processes and laser separation technology
    • 3D integration capabilities and fabrication process optimization
    • Corning's high-density platform and advancement analysis
  • High-Frequency Applications Market
    • Low-loss material requirements for 5G/6G semiconductor packaging
    • Material benchmarking: LTCC vs glass performance characteristics
    • RF applications enabled by glass substrate technology
    • Commercial product analysis and supplier ecosystem
    • Filter substrates, IPD implementations, and antenna-in-package solutions
    • 6G technology enablement and glass interposer applications
  • Technology Benchmarking & Competitive Analysis
    • Glass vs organic substrates: performance, cost, manufacturing comparison
    • Glass vs silicon interposers: technical metrics and economic analysis
    • Hybrid substrate solutions and multi-material integration strategies
    • Future technology roadmaps and performance projection modeling
    • Innovation trends and process technology evolution analysis
  • End-User Market Analysis
    • AI and high-performance computing market requirements and growth drivers
    • Data center infrastructure scaling and performance efficiency demands
    • Telecommunications 5G/6G evolution and RF component specifications
    • Automotive electronics: ADAS, EV, autonomous driving applications
    • Consumer electronics: mobile, wearable, gaming system integration
  • Market Challenges & Strategic Opportunities
    • Technical challenges: manufacturing maturity, yield optimization, standardization
    • Economic barriers: cost competitiveness, investment requirements, adoption timelines
    • Strategic opportunities: performance differentiation and new application development
    • Technology convergence benefits and market expansion potential
  • Future Outlook & Market Scenarios
    • Technology evolution projections and material development roadmaps
    • Advanced manufacturing process development and integration advances
    • Performance enhancement projections and capability scaling
    • Market development scenarios: optimistic, conservative, disruptive impact analysis
  • Comprehensive Company Profiles. Profiles of 35 companies including Absolics, BOE, Corning, Intel, JNTC Co., Ltd., KCC, LG Innotek, LPKF, Nippon Electric Glass (NEG), Plan Optik AG, Samsung Electro-Mechanics (Semco), Toppan and more......

The report includes:

  • PDF report. Print edition also available. 
  • Comprehensive Excel spreadsheet of all data.
  • Mid-year Update

Table of Contents

1           EXECUTIVE SUMMARY
1.1        Glass Materials Overview
1.2        Applications of Glass in Semiconductors
1.3        Glass for Advanced Packaging
1.4        Glass Used in Various Semiconductor Applications
1.5        Opportunities with Glass Packaging
1.6        Advantages of Glass Substrates
1.7        Challenges in Adopting Glass Substrates
1.8        Future Market Trends
1.8.1     Advanced Processing Technologies
1.8.2     Integrated Packaging Solutions & Sustainable Manufacturing Initiatives
1.9        Value Chain of Glass Substrate
1.9.1     Organic to Glass Core Substrate
1.10      Future Outlook
1.11      Material Innovations
1.12      Global Market Forecasts 2025-2036
1.12.1   Unit Shipment Forecast 2025-2036
1.12.2   Market Value Forecast 2025-2036

2           GLASS SUBSTRATES TECHNOLOGY FUNDAMENTALS
2.1        Glass Materials Properties
2.1.1     Borosilicate Glass Characteristics
2.1.2     Quartz Glass Properties
2.1.3     Specialty Glass Compositions
2.2        Manufacturing Processes
2.2.1     Glass Melting and Forming
2.2.2     Through Glass Via (TGV) Formation
2.2.3     Metallization and Build-up Processes
2.2.4     Panel-Level Processing Technologies
2.3        Design and Process Considerations
2.3.1     Thermal Management
2.3.2     Mechanical Stress Analysis
2.3.3     Electrical Performance Optimization

3           GLASS IN ADVANCED PACKAGING AND IC SUBSTRATES
3.1        Advanced Packaging Evolution
3.1.1     Dimensionality of Advanced Packaging
3.1.2     From 1D Semiconductor Packaging
3.1.3     Advanced Packaging 2D & 2D+
3.1.4     Advanced Packaging 2.5D & 3D
3.1.5     Advanced Packaging 3.5D & 4D
3.1.6     Technology Development Trend for 2.5D and 3D Packaging
3.2        Packaging Architecture and Integration
3.2.1     Intel's Advanced Packaging Roadmap
3.2.2     Heterogeneous Integration Solutions
3.2.3     Overview of System on Chip (SOC)
3.2.4     Overview of Multi-Chip Module (MCM)
3.2.5     System in Package (SiP)
3.2.6     Analysis of System in Package (SiP)
3.3        Glass IC Substrates Evolution
3.3.1     Glass IC Substrates
3.3.2     From Organic to Glass Core Substrate
3.3.3     Evolution of Packaging Substrates in Semiconductors
3.3.4     From Organic to Glass Core
3.3.5     Organic Core Substrate vs. Glass Core Substrate
3.4        Through Glass Via Technology
3.4.1     TSV vs. TGV
3.4.2     Through Glass Via Formation
3.4.3     Through Glass Via Formation Process
3.4.4     Comparison of Through Glass Via Formation Processes
3.4.5     TGV Process and Via Formation Methods
3.4.6     Mechanical and High-Power Laser Drilling
3.4.7     Laser-Induced Deep Etching
3.4.8     LMCE from BSP
3.4.9     Philoptics' TGV Technology
3.4.10   Laser-Induced Modification and Advanced Wet Etching
3.4.11   Comparison Among the TGV Processes
3.4.12   Photosensitive Glass and Wet Etching
3.4.13   Samtec's TGV Technology
3.4.14   TGV of High Aspect Ratio
3.5        TGV Metallization and Processing
3.5.1     TGV Metallization
3.5.2     TGV Metallization Processes
3.5.3     Two-Step Process
3.5.4     Seed Layer Deposition in TGV Metallization
3.5.5     Factors for Alternative TGV Metallization Process
3.5.6     Comparison of TGV Metallization Processes
3.6        Material Properties and Performance
3.6.1     Material Property Comparison for Advanced Packaging
3.6.2     Key Mechanical and Reliability Benefits of Glass
3.6.3     I/O Density
3.6.4     Key Factors Enabling Fine Circuit Patterns on Glass Substrates
3.6.5     Fine Circuit Patterning Reduces DoF
3.6.6     FC-BGA Substrates Lead to Larger Distortions
3.7        Traditional Substrate Limitations
3.7.1     Limitations of Via Formation
3.7.2     SAP Method Limitations
3.7.3     PCB Stack-ups
3.7.4     Traditional Multilayer vs. Build-up PCBs
3.7.5     Build-up Material: ABF
3.7.6     ABF Substrate Manufacturing Process
3.7.7     Flip Chip Ball Grid Array (FC-BGA) Substrate
3.8        Glass Core Substrate Technologies
3.8.1     Glass Core Substrate
3.8.2     Glass Core Substrate Technologies
3.8.3     Glass Interposer vs. Silicon Interposer
3.9        Glass Substrate Manufacturing
3.9.1     Glass Substrate Manufacturing
3.9.2     Organic Core Substrate vs. Glass Core Substrate
3.9.3     Core Layer Fabrication
3.9.4     Build-up Layer Fabrication
3.9.5     Manufacturing Process of Glass Substrate (CHIMES)
3.9.6     Achieving 2/2 µm L/S on Glass Substrate
3.10      Advanced Manufacturing Processes
3.10.1   Glass Fabrication Process
3.10.2   Glass Core 3D Integration
3.10.3   Chip-First Non-TSV 3D Glass Panel Embedding
3.10.4   Intel's Glass Line
3.11      Industry Implementation and Innovation
3.11.1   Features of Glass-based Advanced Packaging and IC Substrates
3.11.2   Advanced Thermal Management for Glass Packages
3.11.3   Glass Innovation

4           GLASS IN PHOTONICS
4.1        Photonic Integration
4.1.1     Overview
4.1.2     Optical Coupling - I/O
4.1.3     EIC/PIC Integration
4.2        Co-Packaged Optics
4.2.1     Co-Packaged Optics
4.2.2     Co-Packaged Optics Architecture
4.2.3     Key Trend of Optical Transceiver
4.2.4     Glass-Based CPO Integration
4.2.5     Glass Interposer-Based CPO Architecture
4.3        Glass Waveguide Technologies
4.3.1     Ion Exchange Waveguide Formation Technology
4.3.2     Dual-Mode Glass Waveguide Performance Characteristics
4.3.3     Adiabatic Glass-to-Silicon Waveguide Coupling for CPO Integration
4.3.4     Glass-Based Fiber Connector Assembly for CPO Applications
4.3.5     Glass Interposer Optical Signal Path Architecture
4.4        Manufacturing and Integration Processes
4.4.1     Glass Interposer Manufacturing Process and Laser Separation Technology
4.4.2     Corning's High-Density 102.4 Tb/s Glass Integration Platform
4.4.3     3D Integration of EIC/PIC with a Glass Interposer
4.4.4     3D Integration of EIC, PIC, ASIC on a Co-Packaged Glass Substrate
4.4.5     Fabrication Process of the 3D Integration of ASIC, EIC, PIC on a Co-Packaged Substrate
4.4.6     Advancements in Glass Integration for Photonics

5           GLASS IN HIGH-FREQUENCY APPLICATIONS
5.1        High-Frequency Material Requirements
5.1.1     Applications of Low-Loss Materials in Semiconductor and Electronics Packaging
5.1.2     Transmission Loss in High-Frequency PCB Design
5.1.3     Glass as a Low-Loss Material
5.1.4     Categories of RF Applications Enabled by Glass in Semiconductor Technology
5.2        Material Benchmarking and Performance
5.2.1     Benchmark of LTCC and Glass Materials
5.2.2     Dielectric Constant: Stability vs Frequency for Different Inorganic Substrates (LTCC, Glass)
5.2.3     Benchmarking of Commercial Low-Loss Materials for 5G PCBs/Components
5.3        Glass Suppliers and Products
5.4        RF Applications and Implementations
5.4.1     Glass as a Filter Substrate
5.4.2     Glass Integrated Passive Devices (IPD) Filter for 5G by Advanced Semiconductor Engineering
5.4.3     Glass Substrate AiP for 5G: Georgia Tech
5.4.4     Glass for 6G: Georgia Tech
5.4.5     Glass Interposers for 6G

6           TECHNOLOGY BENCHMARKING AND COMPARISON
6.1        Glass vs Organic Substrates
6.1.1     Performance Comparison
6.1.2     Cost Analysis
6.1.3     Manufacturing Considerations
6.1.4     Application Suitability
6.2        Glass vs Silicon Interposers
6.2.1     Technical Performance Metrics
6.2.2     Economic Comparison
6.2.3     Scalability Assessment
6.3        Hybrid Substrates
6.3.1     Glass-Organic Hybrid Designs
6.3.2     Multi-Material Integration
6.3.3     Performance Optimization
6.3.4     Cost-Performance Trade-offs
6.4        Future Technology Roadmaps
6.4.1     Material Innovation Trends
6.4.2     Process Technology Evolution
6.4.3     Integration Complexity Growth
6.4.4     Performance Projection Models

7           END-USER MARKET ANALYSIS
7.1        AI and High-Performance Computing
7.1.1     Market Size and Growth Drivers
7.1.2     Technology Requirements
7.1.3     Key Players and Products
7.1.4     Future Development Trends
7.2        Data Centers and Cloud Computing
7.2.1     Infrastructure Scaling Demands
7.2.2     Performance and Efficiency Requirements
7.2.3     Technology Adoption Patterns
7.2.4     Market Opportunity Assessment
7.3        Telecommunications and 5G/6G
7.3.1     Network Infrastructure Evolution
7.3.2     RF Component Requirements
7.3.3     Technology Integration Challenges
7.4        Automotive Electronics
7.4.1     Advanced Driver Assistance Systems
7.4.2     Electric Vehicle Electronics
7.4.3     Autonomous Driving Platforms
7.4.4     Reliability and Safety Requirements
7.5        Consumer Electronics
7.5.1     Mobile Device Applications
7.5.2     Wearable Technology Integration
7.5.3     Gaming and Entertainment Systems

8           CHALLENGES AND OPPORTUNITIES
8.1        Technical Challenges
8.1.1     Manufacturing Process Maturity
8.1.2     Yield and Reliability Issues
8.1.3     Design and Integration Complexity
8.1.4     Standardization Requirements
8.2        Economic and Market Challenges
8.2.1     Cost Competitiveness
8.2.2     Investment Requirements
8.2.3     Customer Adoption Barriers
8.3        Strategic Opportunities
8.3.1     Performance Differentiation
8.3.2     New Application Development
8.3.3     Technology Convergence Benefits

9           FUTURE OUTLOOK
9.1        Technology Evolution Projections
9.1.1     Next-Generation Material Developments
9.1.2     Advanced Manufacturing Processes
9.1.3     Integration Technology Advances
9.1.4     Performance Enhancement Roadmap
9.2        Market Development Scenarios
9.2.1     Optimistic Growth Scenario
9.2.2     Conservative Growth Scenario
9.2.3     Disruptive Technology Impact

10        COMPANY PROFILES  (35 company profiles)
11         APPENDICES
11.1      Technical Glossary and Definitions
11.2      Technology Evolution Timeline
11.3      Market Research Methodology Details

12         REFERENCES
LIST OF TABLES
Table 1. Applications of Glass in Semiconductors.
Table 2. Key Advantages of Glass Substrates.
Table 3. Challenges in Adopting Glass Substrates.
Table 4. Unit Shipment Forecast 2025-2036.
Table 5. Market Value Forecast 2025-2036.
Table 6. Market Forecast by Application Segment.
Table 7. Material Property Comparison Matrix.
Table 8. Glass Material Properties Comparison.
Table 9. Coefficient of Thermal Expansion vs Temperature.
Table 10. Dielectric Properties by Glass Type.
Table 11. TGV Process Comparison Matrix.
Table 12. Metallization Process Options.
Table 13. Build-up Layer Material Options.
Table 14. Panel-Level vs Wafer-Level Processing Comparison.
Table 15. Advanced Packaging Technology Comparison.
Table 16. Glass vs Silicon Interposer Cost Analysis.
Table 17. Material Property Comparison Matrix.
Table 18. TGV Process Comparison Matrix.
Table 19. Panel-Level vs Wafer-Level Processing Comparison.
Table 20. Build-up Layer Material Options.
Table 21. Photonic Integration Market Growth Drivers.
Table 22. CPO vs Traditional Optical Module Comparison.
Table 23. Glass Waveguide Performance Characteristics.
Table 24. Glass Suppliers and Products.
Table 25. RF Application Frequency Requirements.
Table 26. High-Frequency Material Property Requirements.
Table 27. Dielectric Constant vs Frequency Performance.
Table 28. Commercial Low-Loss Materials Comparison.
Table 29. Comprehensive Material Property Comparison.
Table 30. Manufacturing Process Comparison.
Table 31. Application Suitability Matrix
Table 32. Silicon Interposer vs Glass Interposer Analysis
Table 33. Hybrid Substrate Configuration Options
Table 34. End-User Market Size Distribution.
Table 35. AI/HPC Market Requirements Matrix
Table 36. 5G/6G Component Specifications
Table 37. Automotive Electronics Growth Drivers
Table 38. Consumer Electronics Application Analysis
Table 39. Technical Challenge Assessment Matrix.
Table 40. Technology Maturity vs Market Readiness
Table 41. Economic Challenge Analysis
Table 42. Technical Glossary and Definitions.

LIST OF FIGURES
Figure 1. Global Glass Substrates Market Size 2026-2036 (Revenue & Volume)
Figure 2. Market Share by Application Segment 2026 vs 2036.
Figure 3. Technology Readiness Level Assessment by Application.
Figure 4. Value Chain of Glass Substrate.
Figure 5. Unit Shipment Forecast 2025-2036.
Figure 6. Market Value Forecast 2025-2036.
Figure 7. Market Forecast by Application Segment.
Figure 8.TGV Formation Process Flow.
Figure 9. Stacked glass architecture uses uncured ABF dielectric as adhesive, laser via drilling, and copper electroless seed/electroplated fill.
Figure 10. TGV Formation Process Flow.
Figure 11. Photonic Integration Technology Roadmap.
Figure 12. Performance vs Cost Positioning Map
Figure 13. Technology Roadmap Timeline
Figure 14. Performance Enhancement Roadmap.
Figure 15. Absolics' glass substrate.
Figure 16. JNTC Next-Generation Glass Substrate for Semiconductors.
Figure 17. Technology Evolution Timeline.

Companies Mentioned (Partial List)

A selection of companies mentioned in this report includes, but is not limited to:

  • Absolics
  • BOE
  • Corning
  • Intel
  • JNTC Co., Ltd.
  • KCC
  • LG Innotek
  • LPKF
  • Nippon Electric Glass (NEG)
  • Plan Optik AG
  • Samsung Electro-Mechanics (Semco)
  • Toppan