The soft chemical-mechanical polishing pad market size is expected to see strong growth in the next few years. It will grow to $1.57 billion in 2029 at a compound annual growth rate (CAGR) of 8%. The growth expected in the forecast period is driven by rising demand for consumer electronics and automotive semiconductors, increased use of soft pads in back-end-of-line (BEOL) processes, growing adoption of soft pads in logic device manufacturing, the need for high-yield semiconductor production, and expanded use of soft pads for uniform material removal in ultra-low-k dielectric layers. Key trends during this period include advancements in soft pad surface texturing, a shift toward heterogeneous integration and chiplets, innovations in polyurethane and composite soft pad materials, technological progress in hybrid slurry-pad compatibility, and improvements in soft pad conditioning and regeneration techniques.
The expanding semiconductor industry is expected to drive the growth of the soft chemical-mechanical polishing (CMP) pad market. This industry, which designs, manufactures, and sells semiconductor devices such as integrated circuits and transistors, is growing due to rising demand for advanced electronics such as smartphones, computers, and IoT devices that depend on sophisticated semiconductor components for optimal performance. Soft CMP pads play a critical role by enabling precise planarization, ensuring uniform wafer surfaces, and producing high-quality thin films. These pads help reduce defects and material inconsistencies, thereby enhancing device performance and manufacturing efficiency. For example, in July 2025, the Semiconductor Industry Association reported that semiconductor industry sales reached $630.5 billion and are projected to increase by 11.2% to $701 billion in 2025. As a result, the growth of the semiconductor industry is fueling demand for soft CMP pads.
The growing automotive industry is expected to drive the expansion of the soft chemical-mechanical polishing (CMP) pad market. This industry encompasses the design, development, manufacturing, marketing, and sales of motor vehicles such as cars, trucks, and motorcycles, along with their components. The rise in the automotive sector is fueled by consumer demand for advanced, fuel-efficient, and technology-rich vehicles. Soft CMP pads play a vital role by enabling the precise polishing of semiconductor components used in sophisticated vehicle electronics, thereby enhancing component reliability and performance. For example, the European Automobile Manufacturers’ Association (ACEA) reported that global motor vehicle production reached 85.4 million units in 2022, marking a 5.7% increase from 2021. Consequently, the expanding automotive industry is boosting demand for soft CMP pads.
In July 2022, Entegris Inc., a US-based technology and materials science company, acquired CMC Materials Inc. for an undisclosed amount. This acquisition is intended to bolster Entegris’s standing as a global leader in electronic materials and broaden its range of semiconductor fabrication solutions. CMC Materials Inc., also based in the US, specializes in providing soft chemical-mechanical polishing (CMP) pads.
Major players in the soft chemical-mechanical polishing (cmp) pad market are 3M Company, DuPont De Nemours Inc., Cabot Corporation, Entegris Inc., SKC Co. Ltd., KPX Chemical Co. Ltd., Fujibo Holdings Inc., Hubei DingLong Chemical Co. Ltd., JSR Micro Inc., Beijing Grish Hitech Co. Ltd., Fraunhofer ISIT, FNS TECH Co. Ltd., Kemet International Ltd., Alfa Chemistry, Thomas West Inc., Spartan Felt Company Inc., Nitta Haas Inc., Pureon AG, and IV Technologies Inc.
Asia-Pacific was the largest region in the soft chemical-mechanical polishing (CMP) pad market in 2024. Asia-Pacific is expected to be the fastest-growing region in the forecast period. The regions covered in soft chemical-mechanical polishing (CMP) pad report are Asia-Pacific, Western Europe, Eastern Europe, North America, South America, Middle East and Africa. The countries covered in the soft chemical-mechanical polishing (CMP) pad market report are Australia, Brazil, China, France, Germany, India, Indonesia, Japan, Russia, South Korea, UK, USA, Canada, Italy, Spain.
Note that the outlook for this market is being affected by rapid changes in trade relations and tariffs globally. The report will be updated prior to delivery to reflect the latest status, including revised forecasts and quantified impact analysis. The report’s Recommendations and Conclusions sections will be updated to give strategies for entities dealing with the fast-moving international environment.
The intensifying U.S. tariffs and escalating trade tensions in spring 2025 are expected to have a significant impact on the chemicals sector, which is bearing a disproportionate burden, particularly from tariffs on petrochemicals and intermediates, where affordable domestic substitutes are often unavailable. Producers of specialty chemicals, heavily dependent on Chinese raw materials, are experiencing production disruptions. At the same time, fertilizer manufacturers are seeing profit margins eroded due to tariffs on phosphate imports. In response, companies are ramping up R&D into bio-based alternatives, forming procurement alliances to consolidate buying power, and shifting production to tariff-neutral nations such as Saudi Arabia.
A soft chemical-mechanical polishing (CMP) pad is a flexible, low-hardness pad used in semiconductor manufacturing during chemical-mechanical planarization. Its main function is to gently polish wafer surfaces, ensuring uniform material removal while reducing surface defects and dishing. These pads are particularly well-suited for delicate layers or fine features that require controlled, low-pressure planarization.
The primary types of CMP pads include hard pads and soft pads. Hard pads are made from rigid materials that offer firm support and high durability for precise material removal during surface finishing. They are typically composed of materials such as polyurethane, silicon carbide, polyester, and composites. These pads are applied in various processes including wafer polishing, film chemical-mechanical polishing, memory device fabrication, and photonic device production, serving industries such as electronics, automotive, aerospace, and medical devices.
The soft chemical-mechanical polishing (CMP) pad market research report is one of a series of new reports that provides soft chemical-mechanical polishing (CMP) pad market statistics, including soft chemical-mechanical polishing (CMP) pad industry global market size, regional shares, competitors with a soft chemical-mechanical polishing (CMP) pad market share, detailed soft chemical-mechanical polishing (CMP) pad market segments, market trends and opportunities, and any further data you may need to thrive in the soft chemical-mechanical polishing (CMP) pad industry. This soft chemical-mechanical polishing (CMP) pad market research report delivers a complete perspective of everything you need, with an in-depth analysis of the current and future scenario of the industry.
The soft chemical-mechanical polishing (CMP) pad market consists of sales of oxide polishing pads, metal polishing pads, advanced slurry-compatible pads, hard texture pads, and soft texture pads. Values in this market are ‘factory gate’ values, that is, the value of goods sold by the manufacturers or creators of the goods, whether to other entities (including downstream manufacturers, wholesalers, distributors, and retailers) or directly to end customers. The value of goods in this market includes related services sold by the creators of the goods.
The market value is defined as the revenues that enterprises gain from the sale of goods and/or services within the specified market and geography through sales, grants, or donations in terms of the currency (in USD unless otherwise specified).
The revenues for a specified geography are consumption values that are revenues generated by organizations in the specified geography within the market, irrespective of where they are produced. It does not include revenues from resales along the supply chain, either further along the supply chain or as part of other products.
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Table of Contents
Executive Summary
Soft Chemical-Mechanical Polishing (CMP) Pad Global Market Report 2025 provides strategists, marketers and senior management with the critical information they need to assess the market.This report focuses on soft chemical-mechanical polishing (cmp) pad market which is experiencing strong growth. The report gives a guide to the trends which will be shaping the market over the next ten years and beyond.
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Description
Where is the largest and fastest growing market for soft chemical-mechanical polishing (cmp) pad? How does the market relate to the overall economy, demography and other similar markets? What forces will shape the market going forward, including technological disruption, regulatory shifts, and changing consumer preferences? The soft chemical-mechanical polishing (cmp) pad market global report answers all these questions and many more.The report covers market characteristics, size and growth, segmentation, regional and country breakdowns, competitive landscape, market shares, trends and strategies for this market. It traces the market’s historic and forecast market growth by geography.
- The market characteristics section of the report defines and explains the market.
- The market size section gives the market size ($b) covering both the historic growth of the market, and forecasting its development.
- The forecasts are made after considering the major factors currently impacting the market. These include: the technological advancements such as AI and automation, Russia-Ukraine war, trade tariffs (government-imposed import/export duties), elevated inflation and interest rates.
- Market segmentations break down the market into sub markets.
- The regional and country breakdowns section gives an analysis of the market in each geography and the size of the market by geography and compares their historic and forecast growth.
- The competitive landscape chapter gives a description of the competitive nature of the market, market shares, and a description of the leading companies. Key financial deals which have shaped the market in recent years are identified.
- The trends and strategies section analyses the shape of the market as it emerges from the crisis and suggests how companies can grow as the market recovers.
Report Scope
Markets Covered:
1) By Type: Hard Pads; Soft Pads2) By Material Type: Polyurethane; Silicon Carbide; Polyester; Composite Materials
3) By Application: Wafer Polishing; Film Chemical Mechanical Polishing; Memory Device Manufacturing; Photonic Device Manufacturing
4) By End-Use Industry: Electronics Industry; Automotive Industry; Aerospace Industry; Medical Devices Industry
Subsegments:
1) By Hard Pads: Polyurethane Pads; Diamond Conditioned Pads; Thermoplastic Pads; Molded Pads2) By Soft Pads: Non-Woven Pads; Felt Pads; Porous Polymer Pads; Composite Pads
Companies Mentioned: 3M Company; DuPont De Nemours Inc.; Cabot Corporation; Entegris Inc.; SKC Co. Ltd.; KPX Chemical Co. Ltd.; Fujibo Holdings Inc.; Hubei DingLong Chemical Co. Ltd.; JSR Micro Inc.; Beijing Grish Hitech Co. Ltd.; Fraunhofer ISIT; FNS TECH Co. Ltd.; Kemet International Ltd.; Alfa Chemistry; Thomas West Inc.; Spartan Felt Company Inc.; Nitta Haas Inc.; Pureon AG; IV Technologies Inc.
Countries: Australia; Brazil; China; France; Germany; India; Indonesia; Japan; Russia; South Korea; UK; USA; Canada; Italy; Spain.
Regions: Asia-Pacific; Western Europe; Eastern Europe; North America; South America; Middle East; Africa
Time Series: Five years historic and ten years forecast.
Data: Ratios of market size and growth to related markets, GDP proportions, expenditure per capita.
Data Segmentation: Country and regional historic and forecast data, market share of competitors, market segments.
Sourcing and Referencing: Data and analysis throughout the report is sourced using end notes.
Delivery Format: PDF, Word and Excel Data Dashboard.
Companies Mentioned
The companies featured in this Soft Chemical-Mechanical Polishing (CMP) Pad market report include:- 3M Company
- DuPont De Nemours Inc.
- Cabot Corporation
- Entegris Inc.
- SKC Co. Ltd.
- KPX Chemical Co. Ltd.
- Fujibo Holdings Inc.
- Hubei DingLong Chemical Co. Ltd.
- JSR Micro Inc.
- Beijing Grish Hitech Co. Ltd.
- Fraunhofer ISIT
- FNS TECH Co. Ltd.
- Kemet International Ltd.
- Alfa Chemistry
- Thomas West Inc.
- Spartan Felt Company Inc.
- Nitta Haas Inc.
- Pureon AG
- IV Technologies Inc.
Table Information
Report Attribute | Details |
---|---|
No. of Pages | 250 |
Published | October 2025 |
Forecast Period | 2025 - 2029 |
Estimated Market Value ( USD | $ 1.15 Billion |
Forecasted Market Value ( USD | $ 1.57 Billion |
Compound Annual Growth Rate | 8.0% |
Regions Covered | Global |
No. of Companies Mentioned | 20 |