The Global Extreme Ultraviolet (EUV) Lithography Equipment Market was valued at USD 8.66 billion in 2024 and is estimated to grow at a CAGR of 14.9% to reach USD 33.91 billion by 2034.
The market is expanding steadily as the semiconductor industry transitions to advanced process nodes and the complexity of modern electronics continues to rise. Despite the high system costs of USD 200-400 million, EUV technology offers significant efficiency advantages by enabling advanced nodes without the costly multi-patterning steps required by older techniques. Market valuation accounts not only for EUV scanners but also for the complete ecosystem, including light sources, masks, optics, metrology, service contracts, consumables, and system upgrades.
The high-NA EUV systems segment will grow at a CAGR of 17.6% through 2034. The next-generation lithography platforms feature a higher numerical aperture of 0.55 NA, capable of printing features as small as 8nm for sub-2nm nodes. These systems, which commanded USD 370-400 million in cost in 2024, are transitioning from R&D into early production. Their higher upfront expense is offset by reduced complexity and fewer additional patterning steps, offering long-term production efficiency.
EUV optical systems, contributing 15% share and growing at a CAGR of 14.3% through 2034, include precision mirrors, collectors, and optical components critical for system performance. Leading optical suppliers have exclusive agreements to meet the demanding accuracy requirements of EUV systems, often down to the picometer scale.
U.S. Extreme Ultraviolet (EUV) Lithography Equipment Market was valued at USD 2 billion in 2024 and is expected to grow at a CAGR of 15% through 2034. Government initiatives, including a USD 825 million allocation under the CHIPS Act for EUV accelerator programs, are strengthening domestic semiconductor manufacturing capabilities. These incentives are encouraging private sector investment in EUV technologies and boosting the development of local production capacity.
Prominent players in the Extreme Ultraviolet (EUV) Lithography Equipment Market include Lam Research Corporation, Nikon Corporation, ASML Holding N.V., Canon Inc., KLA Corporation, Coherent Corporation, Applied Materials, Inc., Gigaphoton Inc., NuFlare Technology, Inc., Lasertec Corporation, Trumpf SE + Co. KG, Jenoptik AG, SUSS MicroTec SE, EV Group E. Thallner GmbH, SET Corporation, Veeco Instruments Inc., Plasma-Therm LLC, and Oxford Instruments plc. Companies operating in the Extreme Ultraviolet (EUV) Lithography Equipment Market focus on strategies such as investing heavily in research and development to advance system performance, precision, and throughput. Many pursue strategic partnerships and collaborations to enhance technology integration across the semiconductor ecosystem. Firms also expand global manufacturing capacity, optimize supply chains, and establish service networks to ensure high system uptime.
This product will be delivered within 2-4 business days.
The market is expanding steadily as the semiconductor industry transitions to advanced process nodes and the complexity of modern electronics continues to rise. Despite the high system costs of USD 200-400 million, EUV technology offers significant efficiency advantages by enabling advanced nodes without the costly multi-patterning steps required by older techniques. Market valuation accounts not only for EUV scanners but also for the complete ecosystem, including light sources, masks, optics, metrology, service contracts, consumables, and system upgrades.
The high-NA EUV systems segment will grow at a CAGR of 17.6% through 2034. The next-generation lithography platforms feature a higher numerical aperture of 0.55 NA, capable of printing features as small as 8nm for sub-2nm nodes. These systems, which commanded USD 370-400 million in cost in 2024, are transitioning from R&D into early production. Their higher upfront expense is offset by reduced complexity and fewer additional patterning steps, offering long-term production efficiency.
EUV optical systems, contributing 15% share and growing at a CAGR of 14.3% through 2034, include precision mirrors, collectors, and optical components critical for system performance. Leading optical suppliers have exclusive agreements to meet the demanding accuracy requirements of EUV systems, often down to the picometer scale.
U.S. Extreme Ultraviolet (EUV) Lithography Equipment Market was valued at USD 2 billion in 2024 and is expected to grow at a CAGR of 15% through 2034. Government initiatives, including a USD 825 million allocation under the CHIPS Act for EUV accelerator programs, are strengthening domestic semiconductor manufacturing capabilities. These incentives are encouraging private sector investment in EUV technologies and boosting the development of local production capacity.
Prominent players in the Extreme Ultraviolet (EUV) Lithography Equipment Market include Lam Research Corporation, Nikon Corporation, ASML Holding N.V., Canon Inc., KLA Corporation, Coherent Corporation, Applied Materials, Inc., Gigaphoton Inc., NuFlare Technology, Inc., Lasertec Corporation, Trumpf SE + Co. KG, Jenoptik AG, SUSS MicroTec SE, EV Group E. Thallner GmbH, SET Corporation, Veeco Instruments Inc., Plasma-Therm LLC, and Oxford Instruments plc. Companies operating in the Extreme Ultraviolet (EUV) Lithography Equipment Market focus on strategies such as investing heavily in research and development to advance system performance, precision, and throughput. Many pursue strategic partnerships and collaborations to enhance technology integration across the semiconductor ecosystem. Firms also expand global manufacturing capacity, optimize supply chains, and establish service networks to ensure high system uptime.
Comprehensive Market Analysis and Forecast
- Industry trends, key growth drivers, challenges, future opportunities, and regulatory landscape
- Competitive landscape with Porter’s Five Forces and PESTEL analysis
- Market size, segmentation, and regional forecasts
- In-depth company profiles, business strategies, financial insights, and SWOT analysis
This product will be delivered within 2-4 business days.
Table of Contents
Chapter 1 Methodology & Scope
Chapter 2 Executive Summary
Chapter 3 Industry Insights
Chapter 4 Competitive Landscape, 2024
Chapter 5 Market Estimates & Forecast, by Technology Type, 2021-2034 (USD Billion & Units)
Chapter 6 Market Estimates & Forecast, by Equipment Type, 2021-2034 (USD Billion & Units)
Chapter 7 Market Estimates & Forecast, by Technology Node Application, 2021-2034 (USD Billion & Units)
Chapter 8 Market Estimates & Forecast, by End Use Type, 2021-2034 (USD Billion & Units)
Chapter 9 Market Estimates & Forecast, by End Use Industry, 2021-2034 (USD Billion & Units)
Chapter 10 Market Estimates & Forecast, by Region, 2021-2034 (USD Billion & Units)
Chapter 11 Company Profiles
Companies Mentioned
The companies featured in this Extreme Ultraviolet (EUV) Lithography Equipment market report include:- ASML Holding N.V.
- Applied Materials, Inc.
- KLA Corporation
- Lam Research Corporation
- Nikon Corporation
- Coherent Corporation
- Veeco Instruments Inc.
- Plasma-Therm LLC
- Trumpf SE + Co. KG
- Jenoptik AG
- SUSS MicroTec SE
- EV Group E. Thallner GmbH
- Oxford Instruments plc
- Canon Inc.
- Gigaphoton Inc.
- NuFlare Technology, Inc.
- Lasertec Corporation
- SET Corporation
- SUSS MicroTec SE
Table Information
| Report Attribute | Details |
|---|---|
| No. of Pages | 170 |
| Published | November 2025 |
| Forecast Period | 2024 - 2034 |
| Estimated Market Value ( USD | $ 8.66 Billion |
| Forecasted Market Value ( USD | $ 33.91 Billion |
| Compound Annual Growth Rate | 14.9% |
| Regions Covered | Global |
| No. of Companies Mentioned | 19 |
