- Report
- May 2022
- 161 Pages
Global
From €2310EUR$2,499USD£1,947GBP
€3299EUR$3,570USD£2,781GBP
- Report
- December 2022
- 336 Pages
Global
From €2387EUR$2,583USD£2,012GBP
€3410EUR$3,690USD£2,875GBP
- Book
- September 2024
- 528 Pages
- Book
- February 2025
- 432 Pages
- Book
- March 2022
- 336 Pages
- Book
- November 2021
- 512 Pages
- Book
- December 2018
- 546 Pages
- Book
- May 2010
- 752 Pages
- Book
- October 2001
- 864 Pages
- Book
- April 2019
- 440 Pages
- Book
- September 2023
- 448 Pages
- Book
- July 2023
- 464 Pages

Chemical Vapor Deposition (CVD) is a process used in the semiconductor industry to deposit thin films of material onto a substrate. It is used to create a variety of components, such as transistors, capacitors, and resistors. CVD is a cost-effective and efficient way to produce high-quality components with precise control over the thickness and composition of the deposited material. The process involves the introduction of a gas or vaporized material into a heated chamber, where it is then decomposed and deposited onto the substrate.
CVD is used in a variety of semiconductor applications, including the fabrication of integrated circuits, thin-film transistors, and other components. It is also used to create protective coatings for semiconductor devices, as well as to create optical components.
The CVD market is an important part of the semiconductor industry, as it provides a cost-effective and efficient way to produce high-quality components.
Some companies in the CVD market include Applied Materials, Lam Research, Tokyo Electron, ASM International, and Veeco Instruments. Show Less Read more