Results for tag: "Copper Sputtering Target"

Copper sputtering target falls under the category of advanced materials used primarily in the process of physical vapor deposition (PVD). This method is employed in producing thin films and coatings, which is an essential technique in various high-tech industries such as electronics, semiconductors, and solar panel manufacturing. Copper targets are lauded for their excellent electrical and thermal conductivity properties, making them particularly desirable for creating conductive layers in integrated circuits and semiconductor devices. The quality of a copper sputtering target, which can be affected by factors such as purity, grain size, and uniformity, has a profound influence on the performance and reliability of the finished product. The market for copper sputtering targets encompasses a range of products with different dimensions, purities, and bonding requirements to suit various applications. Manufacturers and suppliers develop copper targets that cater to specific needs, ensuring they meet the stringent requirements of advanced technological applications. Some notable companies that operate in the copper sputtering target market include Materion Corporation, Kurt J. Lesker Company, ULVAC, Inc., Plansee SE, and KFMI (KFY Metal Innovation). These enterprises are recognized for their production and supply of high-quality sputtering targets to a broad spectrum of industries utilizing PVD technologies. Show Less Read more