Results for tag: "Plasma Etching"

Plasma etching is a process used in semiconductor manufacturing to create patterns on the surface of a material. It is a type of dry etching, which uses a plasma to remove material from the surface of a substrate. The plasma is generated by applying a high-frequency voltage to a gas, such as oxygen, argon, or fluorine. The plasma is then used to etch the material, creating patterns on the surface. The process is used to create features such as transistors, capacitors, and other components on the surface of a semiconductor. Plasma etching is used in a variety of semiconductor applications, including the fabrication of integrated circuits, memory chips, and other components. It is also used in the production of thin-film transistors, which are used in displays and other electronic devices. The process is also used in the production of photovoltaic cells, which are used to convert sunlight into electricity. The plasma etching market is highly competitive, with a number of companies offering products and services. Some of the major players in the market include Applied Materials, Lam Research, Tokyo Electron, KLA Corporation, and Hitachi High-Technologies. Show Less Read more