Results for tag: "Semiconductor Dry Strip Systems"

In the field of semiconductor manufacturing, dry strip systems constitute critical subsystems used for the removal of photoresist and other organic materials from the surface of silicon wafers during the fabrication process. This technique falls under the category of plasma etching, where reactive ions are generated in a vacuum chamber to chemically strip away unwanted materials. Dry stripping offers advantages such as precise control over etching rates and cleanliness, factors essential for maintaining the strict purity and fabrication standards necessary in semiconductor production. The performance of these systems is evaluated based on efficiency, throughput, and their ability to integrate with other processes in the semiconductor manufacturing line. As technology nodes advance and the microelectronics industry demands ever-greater precision and miniaturization of components, the role of dry strip systems continues to evolve with the introduction of new materials and complex device structures. Within the semiconductor dry strip systems market, there are several prominent companies known for their contributions to the field. Applied Materials, Inc. is a major player, offering a range of equipment and services for semiconductor processing. Lam Research Corporation is another key company, recognized for providing innovative dry strip solutions. Tokyo Electron Limited, with its global presence, offers semiconductor production systems, including dry etching equipment. Mattson Technology develops and markets dry strip and rapid thermal processing equipment, serving the needs of semiconductor manufacturers. Additionally, Hitachi High-Technologies Corporation provides advanced etching systems that feature dry strip capabilities. These companies remain at the forefront of technology innovation, catering to the evolving demands of Show Less Read more