The Asia Pacific Extreme Ultraviolet Lithography (EUVL) Systems Market is expected to witness market growth of 21.9% CAGR during the forecast period (2022-2028).
Even with two exposures utilizing 193 nm immersion, the utility resources needed for EUV are much greater. For example, to get 200 watts at an intermediate focus for 100 wafers per hour, it is expected to need 1 megawatt of input power, compared to 165 kilowatts for an ArF immersion scanner. Even at the identical throughput, the footprint of the EUV scanner remains 3x that of an ArF immersion scanner. In addition, a superconducting magnet might be necessary to contain the ion debris.
Condensed matter or neutral atoms are unable to emit EUV radiation. Prior to EUV emission in the matter, ionization is required. Only in a hot, dense plasma, which also substantially absorbs EUV, can multi-charged positive ions be thermally produced. As of 2016, a laser-pulsed tin plasma serves as the standard EUV light source. The ions quickly neutralize by plasma electrons to lower charge states, which create light mostly at other, useless wavelengths, absorbing the EUV light they release.
The government efforts in order to strengthen consumer electronics are increasing in the region. For example, the $300 billion Sustainable Electronics Manufacturing & Exports by 2026 plan and vision document for the electronics industry were released by the Ministry of Electronics and Information Technology in collaboration with ICEA. The first volume of the two-part Vision Document, titled Increasing India's Electronics Exports and Share in GVCs, was published in November 2021. This roadmap is the second volume of that document. According to the Vision Document, exports are anticipated to rise from the estimated US$15 billion in 2021-2022 to US$120 billion by 2026. Over the following years, the regional market is anticipated to grow from US$65 billion to US$180 billion.
The China market dominated the Asia Pacific Extreme Ultraviolet Lithography (EUVL) Systems Market by Country in 2021, and is expected to continue to be a dominant market till 2028; thereby, achieving a market value of $2,443.9 Million by 2028. The Japan market is estimated to grow a CAGR of 21.2% during (2022 - 2028). Additionally, The India market is expected to experience a CAGR of 22.7% during (2022 - 2028).
Based on Equipment, the market is segmented into Light Source (Laser Produced Plasmas (LPP), Vacuum Sparks, and Gas Discharges), Mirrors, Masks, and Others. The report also covers geographical segmentation of Extreme Ultraviolet Lithography (EUVL) Systems market. Based on countries, the market is segmented into China, Japan, India, South Korea, Singapore, Malaysia, and Rest of Asia Pacific.
The market research report covers the analysis of key stake holders of the market. Key companies profiled in the report include Intel Corporation, Samsung Electronics Co., Ltd. (Samsung Group), Toshiba Corporation, Carl Zeiss AG, Nikon Corporation, ASML Holding N.V., Canon, Inc., Taiwan Semiconductor Manufacturing Company Limited, Toppan Inc., and NTT Advanced Technology Corporation (Nippon Telegraph and Telephone Corporation).
Even with two exposures utilizing 193 nm immersion, the utility resources needed for EUV are much greater. For example, to get 200 watts at an intermediate focus for 100 wafers per hour, it is expected to need 1 megawatt of input power, compared to 165 kilowatts for an ArF immersion scanner. Even at the identical throughput, the footprint of the EUV scanner remains 3x that of an ArF immersion scanner. In addition, a superconducting magnet might be necessary to contain the ion debris.
Condensed matter or neutral atoms are unable to emit EUV radiation. Prior to EUV emission in the matter, ionization is required. Only in a hot, dense plasma, which also substantially absorbs EUV, can multi-charged positive ions be thermally produced. As of 2016, a laser-pulsed tin plasma serves as the standard EUV light source. The ions quickly neutralize by plasma electrons to lower charge states, which create light mostly at other, useless wavelengths, absorbing the EUV light they release.
The government efforts in order to strengthen consumer electronics are increasing in the region. For example, the $300 billion Sustainable Electronics Manufacturing & Exports by 2026 plan and vision document for the electronics industry were released by the Ministry of Electronics and Information Technology in collaboration with ICEA. The first volume of the two-part Vision Document, titled Increasing India's Electronics Exports and Share in GVCs, was published in November 2021. This roadmap is the second volume of that document. According to the Vision Document, exports are anticipated to rise from the estimated US$15 billion in 2021-2022 to US$120 billion by 2026. Over the following years, the regional market is anticipated to grow from US$65 billion to US$180 billion.
The China market dominated the Asia Pacific Extreme Ultraviolet Lithography (EUVL) Systems Market by Country in 2021, and is expected to continue to be a dominant market till 2028; thereby, achieving a market value of $2,443.9 Million by 2028. The Japan market is estimated to grow a CAGR of 21.2% during (2022 - 2028). Additionally, The India market is expected to experience a CAGR of 22.7% during (2022 - 2028).
Based on Equipment, the market is segmented into Light Source (Laser Produced Plasmas (LPP), Vacuum Sparks, and Gas Discharges), Mirrors, Masks, and Others. The report also covers geographical segmentation of Extreme Ultraviolet Lithography (EUVL) Systems market. Based on countries, the market is segmented into China, Japan, India, South Korea, Singapore, Malaysia, and Rest of Asia Pacific.
The market research report covers the analysis of key stake holders of the market. Key companies profiled in the report include Intel Corporation, Samsung Electronics Co., Ltd. (Samsung Group), Toshiba Corporation, Carl Zeiss AG, Nikon Corporation, ASML Holding N.V., Canon, Inc., Taiwan Semiconductor Manufacturing Company Limited, Toppan Inc., and NTT Advanced Technology Corporation (Nippon Telegraph and Telephone Corporation).
Scope of the Study
Market Segments Covered in the Report:
By Equipment
- Light Source
- Laser Produced Plasmas (LPP)
- Vacuum Sparks
- Gas Discharges
- Mirrors
- Masks
- Others
By Country
- China
- Japan
- India
- South Korea
- Singapore
- Malaysia
- Rest of Asia Pacific
Key Market Players
List of Companies Profiled in the Report:
- Intel Corporation
- Samsung Electronics Co., Ltd. (Samsung Group)
- Toshiba Corporation
- Carl Zeiss AG
- Nikon Corporation
- ASML Holding N.V.
- Canon, Inc.
- Taiwan Semiconductor Manufacturing Company Limited
- Toppan Inc.
- NTT Advanced Technology Corporation (Nippon Telegraph and Telephone Corporation)
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Table of Contents
Chapter 1. Market Scope & Methodology
Chapter 2. Market Overview
Chapter 3. Competition Analysis - Global
Chapter 4. Asia Pacific Extreme Ultraviolet Lithography (EUVL) Systems Market by Equipment
Chapter 5. Asia Pacific Extreme Ultraviolet Lithography (EUVL) Systems Market by Country
Chapter 6. Company Profiles
Companies Mentioned
- Intel Corporation
- Samsung Electronics Co., Ltd. (Samsung Group)
- Toshiba Corporation
- Carl Zeiss AG
- Nikon Corporation
- ASML Holding N.V.
- Canon, Inc.
- Taiwan Semiconductor Manufacturing Company Limited
- Toppan Inc.
- NTT Advanced Technology Corporation (Nippon Telegraph and Telephone Corporation)
Methodology
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