The Latin America, Middle East and Africa Extreme Ultraviolet Lithography (EUVL) Systems Market is expected to witness market growth of 23.8% CAGR during the forecast period (2022-2028).
Condensed matter or neutral atoms are unable to emit EUV radiation. Prior to EUV emission in the matter, ionization is required. Only in a hot, dense plasma, which also substantially absorbs EUV, can multi-charged positive ions be thermally produced. As of 2016, a laser-pulsed tin plasma serves as the standard EUV light source. The ions quickly neutralize by plasma electrons to lower charge states, which create light mostly at other, useless wavelengths, absorbing the EUV light they release. This leads to a significantly decreased efficiency of light generation for lithography at greater plasma power densities.
The dose divided by the source power determines the throughput. In the event that the pulse power cannot be raised, a greater dose necessitates a slower stage motion or lower throughput. While even during the first few billion pulses, there is still a 20% (+/-10%) variability, EUV collector reflectivity declines by 0.1-0.3% per billion 50 kHz pulses (10% in 2 weeks), resulting in a loss of uptime and throughput. This might be caused by the accumulating Sn residue described above that has not been fully removed. Contrarily, the output from double patterning using traditional immersion lithography techniques is consistent for up to a year.
In the countryside of Namibia, it is becoming usual to witness people selling mushrooms through their phones. The speed with which regional people pick up new technologies reflects the time in which they live. For the first time, this generation has direct access to cutting-edge technologies. In contemporary African society, cell phones are practically universal. They are the obsession of teenagers as well as young adults, who carry them everywhere. There are 650 million mobile phone users in Africa, more than in various developed countries, according to the World Bank and African Development Bank.
The Brazil market dominated the LAMEA Extreme Ultraviolet Lithography (EUVL) Systems Market by Country in 2021, and is expected to continue to be a dominant market till 2028; thereby, achieving a market value of $392.9 Million by 2028. The Argentina market is experiencing a CAGR of 24.4% during (2022 - 2028). Additionally, The UAE market is expected to display a CAGR of 23.4% during (2022 - 2028).
Based on Equipment, the market is segmented into Light Source (Laser Produced Plasmas (LPP), Vacuum Sparks, and Gas Discharges), Mirrors, Masks, and Others. The report also covers geographical segmentation of Extreme Ultraviolet Lithography (EUVL) Systems market. Based on countries, the market is segmented into Brazil, Argentina, UAE, Saudi Arabia, South Africa, Nigeria, and Rest of LAMEA.
The market research report covers the analysis of key stake holders of the market. Key companies profiled in the report include Intel Corporation, Samsung Electronics Co., Ltd. (Samsung Group), Toshiba Corporation, Carl Zeiss AG, Nikon Corporation, ASML Holding N.V., Canon, Inc., Taiwan Semiconductor Manufacturing Company Limited, Toppan Inc., and NTT Advanced Technology Corporation (Nippon Telegraph and Telephone Corporation).
Condensed matter or neutral atoms are unable to emit EUV radiation. Prior to EUV emission in the matter, ionization is required. Only in a hot, dense plasma, which also substantially absorbs EUV, can multi-charged positive ions be thermally produced. As of 2016, a laser-pulsed tin plasma serves as the standard EUV light source. The ions quickly neutralize by plasma electrons to lower charge states, which create light mostly at other, useless wavelengths, absorbing the EUV light they release. This leads to a significantly decreased efficiency of light generation for lithography at greater plasma power densities.
The dose divided by the source power determines the throughput. In the event that the pulse power cannot be raised, a greater dose necessitates a slower stage motion or lower throughput. While even during the first few billion pulses, there is still a 20% (+/-10%) variability, EUV collector reflectivity declines by 0.1-0.3% per billion 50 kHz pulses (10% in 2 weeks), resulting in a loss of uptime and throughput. This might be caused by the accumulating Sn residue described above that has not been fully removed. Contrarily, the output from double patterning using traditional immersion lithography techniques is consistent for up to a year.
In the countryside of Namibia, it is becoming usual to witness people selling mushrooms through their phones. The speed with which regional people pick up new technologies reflects the time in which they live. For the first time, this generation has direct access to cutting-edge technologies. In contemporary African society, cell phones are practically universal. They are the obsession of teenagers as well as young adults, who carry them everywhere. There are 650 million mobile phone users in Africa, more than in various developed countries, according to the World Bank and African Development Bank.
The Brazil market dominated the LAMEA Extreme Ultraviolet Lithography (EUVL) Systems Market by Country in 2021, and is expected to continue to be a dominant market till 2028; thereby, achieving a market value of $392.9 Million by 2028. The Argentina market is experiencing a CAGR of 24.4% during (2022 - 2028). Additionally, The UAE market is expected to display a CAGR of 23.4% during (2022 - 2028).
Based on Equipment, the market is segmented into Light Source (Laser Produced Plasmas (LPP), Vacuum Sparks, and Gas Discharges), Mirrors, Masks, and Others. The report also covers geographical segmentation of Extreme Ultraviolet Lithography (EUVL) Systems market. Based on countries, the market is segmented into Brazil, Argentina, UAE, Saudi Arabia, South Africa, Nigeria, and Rest of LAMEA.
The market research report covers the analysis of key stake holders of the market. Key companies profiled in the report include Intel Corporation, Samsung Electronics Co., Ltd. (Samsung Group), Toshiba Corporation, Carl Zeiss AG, Nikon Corporation, ASML Holding N.V., Canon, Inc., Taiwan Semiconductor Manufacturing Company Limited, Toppan Inc., and NTT Advanced Technology Corporation (Nippon Telegraph and Telephone Corporation).
Scope of the Study
Market Segments Covered in the Report:
By Equipment
- Light Source
- Laser Produced Plasmas (LPP)
- Vacuum Sparks
- Gas Discharges
- Mirrors
- Masks
- Others
By Country
- Brazil
- Argentina
- UAE
- Saudi Arabia
- South Africa
- Nigeria
- Rest of LAMEA
Key Market Players
List of Companies Profiled in the Report:
- Intel Corporation
- Samsung Electronics Co., Ltd. (Samsung Group)
- Toshiba Corporation
- Carl Zeiss AG
- Nikon Corporation
- ASML Holding N.V.
- Canon, Inc.
- Taiwan Semiconductor Manufacturing Company Limited
- Toppan Inc.
- NTT Advanced Technology Corporation (Nippon Telegraph and Telephone Corporation)
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Table of Contents
Chapter 1. Market Scope & Methodology
Chapter 2. Market Overview
Chapter 3. Competition Analysis - Global
Chapter 4. LAMEA Extreme Ultraviolet Lithography (EUVL) Systems Market by Equipment
Chapter 5. LAMEA Extreme Ultraviolet Lithography (EUVL) Systems Market by Country
Chapter 6. Company Profiles
Companies Mentioned
- Intel Corporation
- Samsung Electronics Co., Ltd. (Samsung Group)
- Toshiba Corporation
- Carl Zeiss AG
- Nikon Corporation
- ASML Holding N.V.
- Canon, Inc.
- Taiwan Semiconductor Manufacturing Company Limited
- Toppan Inc.
- NTT Advanced Technology Corporation (Nippon Telegraph and Telephone Corporation)
Methodology
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