The Europe Extreme Ultraviolet Lithography (EUVL) Systems Market is expected to witness market growth of 20.8% CAGR during the forecast period (2022-2028).
Deep ultraviolet lithography has been significantly modified by EUVL. EUV radiation is absorbed by all materials. This means that EUV lithography needs a vacuum. Any one of these mirrors absorbs about 30% of the incident light, and all-optical components, including the photomask, have to use fault-free molybdenum/silicon (Mo/Si) multilayers (composed of 40 Mo/Si bilayers), which work to reflect light by interlayer interference.
At least two condenser multilayered mirrors, six projection multilayer mirrors, and a multilayer object are present in current EUVL systems. The optimal EUV source must be substantially brighter than its predecessors because mirrors absorb a significant amount of the EUV light. The development of EUV sources has mostly focused on plasmas produced by laser or discharge pulses. The expensive collector mirror needs to be replaced every year since it is directly exposed to the plasma and is susceptible to damage by high-energy ions as well as other debris, such as tin droplets.
The growth of the EUVL systems market in the region is owing to the rising demand for advanced and automated vehicles as well as the development of the automotive sector. 13.8 million Europeans have direct or indirect occupations in the automotive industry, which accounts for 6.1% of all employment in the EU. The direct manufacturing of motor vehicles employs 2.6 million people or 8.5% of all manufacturing jobs in the EU. The EU is one of the world's top makers of automobiles, and this industry represents the greatest private investor in R&D. The European Commission encourages technology harmonization and provides funds for R&D in order to increase the competitiveness of the EU automobile industry and maintain its position as a technological leader worldwide.
The Germany market dominated the Europe Extreme Ultraviolet Lithography (EUVL) Systems Market by Country in 2021, and is expected to continue to be a dominant market till 2028; thereby, achieving a market value of $1,451.1 Million by 2028. The UK market is anticipated to grow at a CAGR of 19.7% during (2022 - 2028). Additionally, The France market is expected to exhibit a CAGR of 21.7% during (2022 - 2028).
Based on Equipment, the market is segmented into Light Source (Laser Produced Plasmas (LPP), Vacuum Sparks, and Gas Discharges), Mirrors, Masks, and Others. The report also covers geographical segmentation of Extreme Ultraviolet Lithography (EUVL) Systems market. Based on countries, the market is segmented into Germany, UK, France, Russia, Spain, Italy, and Rest of Europe.
The market research report covers the analysis of key stake holders of the market. Key companies profiled in the report include Intel Corporation, Samsung Electronics Co., Ltd. (Samsung Group), Toshiba Corporation, Carl Zeiss AG, Nikon Corporation, ASML Holding N.V., Canon, Inc., Taiwan Semiconductor Manufacturing Company Limited, Toppan Inc., and NTT Advanced Technology Corporation (Nippon Telegraph and Telephone Corporation).
Deep ultraviolet lithography has been significantly modified by EUVL. EUV radiation is absorbed by all materials. This means that EUV lithography needs a vacuum. Any one of these mirrors absorbs about 30% of the incident light, and all-optical components, including the photomask, have to use fault-free molybdenum/silicon (Mo/Si) multilayers (composed of 40 Mo/Si bilayers), which work to reflect light by interlayer interference.
At least two condenser multilayered mirrors, six projection multilayer mirrors, and a multilayer object are present in current EUVL systems. The optimal EUV source must be substantially brighter than its predecessors because mirrors absorb a significant amount of the EUV light. The development of EUV sources has mostly focused on plasmas produced by laser or discharge pulses. The expensive collector mirror needs to be replaced every year since it is directly exposed to the plasma and is susceptible to damage by high-energy ions as well as other debris, such as tin droplets.
The growth of the EUVL systems market in the region is owing to the rising demand for advanced and automated vehicles as well as the development of the automotive sector. 13.8 million Europeans have direct or indirect occupations in the automotive industry, which accounts for 6.1% of all employment in the EU. The direct manufacturing of motor vehicles employs 2.6 million people or 8.5% of all manufacturing jobs in the EU. The EU is one of the world's top makers of automobiles, and this industry represents the greatest private investor in R&D. The European Commission encourages technology harmonization and provides funds for R&D in order to increase the competitiveness of the EU automobile industry and maintain its position as a technological leader worldwide.
The Germany market dominated the Europe Extreme Ultraviolet Lithography (EUVL) Systems Market by Country in 2021, and is expected to continue to be a dominant market till 2028; thereby, achieving a market value of $1,451.1 Million by 2028. The UK market is anticipated to grow at a CAGR of 19.7% during (2022 - 2028). Additionally, The France market is expected to exhibit a CAGR of 21.7% during (2022 - 2028).
Based on Equipment, the market is segmented into Light Source (Laser Produced Plasmas (LPP), Vacuum Sparks, and Gas Discharges), Mirrors, Masks, and Others. The report also covers geographical segmentation of Extreme Ultraviolet Lithography (EUVL) Systems market. Based on countries, the market is segmented into Germany, UK, France, Russia, Spain, Italy, and Rest of Europe.
The market research report covers the analysis of key stake holders of the market. Key companies profiled in the report include Intel Corporation, Samsung Electronics Co., Ltd. (Samsung Group), Toshiba Corporation, Carl Zeiss AG, Nikon Corporation, ASML Holding N.V., Canon, Inc., Taiwan Semiconductor Manufacturing Company Limited, Toppan Inc., and NTT Advanced Technology Corporation (Nippon Telegraph and Telephone Corporation).
Scope of the Study
Market Segments Covered in the Report:
By Equipment
- Light Source
- Laser Produced Plasmas (LPP)
- Vacuum Sparks
- Gas Discharges
- Mirrors
- Masks
- Others
By Country
- US
- Canada
- Mexico
- Rest of North America
Key Market Players
List of Companies Profiled in the Report:
- Intel Corporation
- Samsung Electronics Co., Ltd. (Samsung Group)
- Toshiba Corporation
- Carl Zeiss AG
- Nikon Corporation
- ASML Holding N.V.
- Canon, Inc.
- Taiwan Semiconductor Manufacturing Company Limited
- Toppan Inc.
- NTT Advanced Technology Corporation (Nippon Telegraph and Telephone Corporation)
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Table of Contents
Chapter 1. Market Scope & Methodology
Chapter 2. Market Overview
Chapter 3. Competition Analysis - Global
Chapter 4. Europe Extreme Ultraviolet Lithography (EUVL) Systems Market by Equipment
Chapter 5. Europe Extreme Ultraviolet Lithography (EUVL) Systems Market by Country
Chapter 6. Company Profiles
Companies Mentioned
- Intel Corporation
- Samsung Electronics Co., Ltd. (Samsung Group)
- Toshiba Corporation
- Carl Zeiss AG
- Nikon Corporation
- ASML Holding N.V.
- Canon, Inc.
- Taiwan Semiconductor Manufacturing Company Limited
- Toppan Inc.
- NTT Advanced Technology Corporation (Nippon Telegraph and Telephone Corporation)
Methodology
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